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公开(公告)号：US5578676A
公开(公告)日：1996-11-26
申请号：US55793
申请日：1993-04-30
申请人： Tony Flaim , James Lamb, III , Kimberly A. Moeckli , Terry Brewer
发明人： Tony Flaim , James Lamb, III , Kimberly A. Moeckli , Terry Brewer
CPC分类号： C08G83/00 , C08G18/3872 , C08G75/23 , C08J3/091 , G03F7/091
摘要： A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
摘要翻译： 公开了用于形成用于DUV微光刻工艺的抗反射层的组合物和方法。 本发明的组合物包括溶解在合适溶剂中的聚合物。 聚合物是在深紫外波长下具有固有的光吸收性能的聚砜和聚脲聚合物。 根据本发明的方法，将这些组合物施加到基底上以形成抗反射涂层，然后施加与抗反射涂层相容的光致抗蚀剂材料。
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2.发明授权Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating 失效利用具有抗反射涂层光吸收特性的聚合物的光刻制品
公开(公告)号：US5368989A
公开(公告)日：1994-11-29
申请号：US55916
申请日：1993-04-30
CPC分类号： C08G75/23 , C08G18/3872 , C08G83/00 , C08J3/091 , G03F7/091
摘要： A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
摘要翻译： 公开了用于形成用于DUV微光刻工艺的抗反射层的组合物和方法。 本发明的组合物包括溶解在合适溶剂中的聚合物。 聚合物是在深紫外波长下具有固有的光吸收性能的聚砜和聚脲聚合物。 根据本发明的方法，将这些组合物施加到基底上以形成抗反射涂层，然后施加与抗反射涂层相容的光致抗蚀剂材料。
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3.发明授权Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography 失效具有固有光吸收性能的聚合物，用于深紫外光刻中的抗反射涂层应用
公开(公告)号：US5234990A
公开(公告)日：1993-08-10
申请号：US835715
申请日：1992-02-12
申请人： Tony Flaim , James Lamb, III , Kimberly A. Moeckli , Terry Brewer
发明人： Tony Flaim , James Lamb, III , Kimberly A. Moeckli , Terry Brewer
CPC分类号： G03F7/091 , C08G18/3872 , C08G75/23 , C08G83/00 , C08J3/091
摘要： A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
摘要翻译： 公开了用于形成用于DUV微光刻工艺的抗反射层的组合物和方法。 本发明的组合物包括溶解在合适溶剂中的聚合物。 聚合物是在深紫外波长下具有固有的光吸收性能的聚砜和聚脲聚合物。 根据本发明的方法，将这些组合物施加到基底上以形成抗反射涂层，然后施加与抗反射涂层相容的光致抗蚀剂材料。
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