发明授权
US5256517A Positive-working radiation-sensitive mixture and recording material for
exposure to UV radiation containing polyfunctional compound having
.alpha.-.beta.-keto ester units and sulfonate units
失效
用于暴露于UV辐射的正性辐射敏感混合物和记录材料,其含有具有α-重氮基 - β-酮酯单元和磺酸酯单元的多官能化合物
- 专利标题: Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units
- 专利标题(中): 用于暴露于UV辐射的正性辐射敏感混合物和记录材料,其含有具有α-重氮基 - β-酮酯单元和磺酸酯单元的多官能化合物
-
申请号: US694353申请日: 1991-05-01
-
公开(公告)号: US5256517A公开(公告)日: 1993-10-26
- 发明人: Horst Roeschert , Georg Pawlowski , Hans-Joachim Merrem , Ralph Dammel , Walter Spiess
- 申请人: Horst Roeschert , Georg Pawlowski , Hans-Joachim Merrem , Ralph Dammel , Walter Spiess
- 申请人地址: DEX Frankfurt am Main
- 专利权人: Hoechst Aktiengesellschaft
- 当前专利权人: Hoechst Aktiengesellschaft
- 当前专利权人地址: DEX Frankfurt am Main
- 优先权: DEX4014648 19900508
- 主分类号: G03F7/016
- IPC分类号: G03F7/016 ; G03F7/039 ; H01L21/027 ; G03F7/022 ; G03F7/023
摘要:
A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive component, which contains .alpha.-diazo-.beta.-keto ester units and sulfonate units of the formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, are an unsubstituted or substituted aliphatic, cycloaliphatic, araliphatic or aromatic radical having 4 to 20 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by N or NH groups and/or contain keto groups,X is an unsubstituted or substituted aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by the groups --NR.sup.3 --, --C(O)--0--, --C(O)--NR.sup.3 --, ##STR2## --NR.sup.3 --C(O)--NR.sup.4 --, --O--C(O)--NR.sup.3 --, ##STR3## or --O--C(O)--O--, or CH groups to be replaced by ##STR4## in which R.sup.3 and R.sup.4, independently of one another, are hydrogen or an unsubstituted or substituted aliphatic, carbocyclic or araliphatic radical,m is an integer from 3 to 8,n is an integer from 1 to 3, and m>n.The radiation-sensitive mixture is especially suitable for exposure to radiation having a wavelength of about 190 to 300 nm.
公开/授权文献
信息查询
IPC分类: