发明授权
- 专利标题: Evacuation system and method therefor
- 专利标题(中): 疏散系统及其方法
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申请号: US873175申请日: 1992-04-24
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公开(公告)号: US5259735A公开(公告)日: 1993-11-09
- 发明人: Kazue Takahashi , Shinjiro Ueda , Manabu Edamura , Naoyuki Tamura , Kazuaki Ichihashi
- 申请人: Kazue Takahashi , Shinjiro Ueda , Manabu Edamura , Naoyuki Tamura , Kazuaki Ichihashi
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-095147 19910425
- 主分类号: B01D19/00
- IPC分类号: B01D19/00 ; B01D8/00 ; B01J3/00 ; B01J3/02 ; B01L7/00 ; B01L99/00 ; C23C14/54 ; C23C14/56 ; F04B23/14 ; F04B37/08
摘要:
An evacuation system in an ultra-high vacuum sputtering apparatus capable of shortening the pumping time of the system. A main pump, composed of a turbo-molecular pump and a baffle is positioned upstream of a main pump and cooled to a temperature in which argon gas is not absorbed and only water is absorbed. The pump and a vacuum chamber are separated by a valve. A pipeline circulates a heating medium to rapidly heat and cool the vacuum chamber for enabling a gas discharge from the vacuum chamber whereby the pumping time can be reduced and the overall production of the system can be increased.
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