发明授权
- 专利标题: Presensitized plates for lithography not requiring dampening with water
- 专利标题(中): 用于光刻的不敏感板不需要用水润湿
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申请号: US726811申请日: 1991-07-08
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公开(公告)号: US5266443A公开(公告)日: 1993-11-30
- 发明人: Tatsuji Higashi , Toshio Ohba
- 申请人: Tatsuji Higashi , Toshio Ohba
- 申请人地址: JPX Minami-Ashigara JPX Tokyo
- 专利权人: Fuji Photo Film Co., Ltd.,Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.,Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Minami-Ashigara JPX Tokyo
- 优先权: JPX2-181250 19900709
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; G03F7/075 ; G03C1/76
摘要:
A dry PS plate having a substrate provided thereon with a photopolymerizable light-sensitive layer and a silicone rubber layer in that order. The silicone rubber layer comprises a product obtained by crosslinking through addition reaction the following components:(a) an alkenylpolysiloxane having at least two alkenyl groups directly bonded to the silicon atoms in each molecule thereof; and(b) a hydrogen polysiloxane of the following general formula I: ##STR1## wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom or methyl group, R.sup.3 and R.sup.4 independently represent a methyl, vinyl or phenyl group, m+n is 5 to 30 and m:n is 3:1 to 1:3. The dry PS plate provides a lithographic printing plate exhibiting excellent tone reproducibility and printing durability as well as not being subject to background contamination.
公开/授权文献
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