Invention Grant
- Patent Title: Surface volatile material detector
- Patent Title (中): 表面挥发性物质检测器
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Application No.: US082142Application Date: 1993-06-23
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Publication No.: US5287725APublication Date: 1994-02-22
- Inventor: Jun Zhao , Laszlo Szalai , Boris Fishkin , Terry Francis
- Applicant: Jun Zhao , Laszlo Szalai , Boris Fishkin , Terry Francis
- Applicant Address: CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: CA Santa Clara
- Main IPC: G01N1/22
- IPC: G01N1/22 ; G01N1/00 ; G01N15/00 ; G01N21/37 ; H01L21/66
Abstract:
Surface Volatile Material Detector including a vacuum chamber that is adapted to hold a silicon wafer for testing. The surface of the wafer is exposed to a heat source which evaporates the volatile contaminants on the surface of the wafer. A gas composition analyzer samples the atmosphere within the chamber to detect the evaporated contaminants. The device is designed such that the wafer is thermally insulated from the chamber, whereby the wafer is heated while the chamber walls remain cool, and any contaminants which might exist on the walls of the chamber are not evaporated. In the preferred embodiment, the wafer is heated by infrared light illumination.
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