发明授权
US5288587A Radiation-sensitive positive resist composition comprising an o-quinone
diazide, an alkali-soluble resin and a polyphenol compound
失效
包含邻醌二叠氮化物,碱溶性树脂和多酚化合物的辐射敏感正性抗蚀剂组合物
- 专利标题: Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound
- 专利标题(中): 包含邻醌二叠氮化物,碱溶性树脂和多酚化合物的辐射敏感正性抗蚀剂组合物
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申请号: US43151申请日: 1993-03-31
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公开(公告)号: US5288587A公开(公告)日: 1994-02-22
- 发明人: Haruyoshi Osaki , Yasunori Uetani
- 申请人: Haruyoshi Osaki , Yasunori Uetani
- 申请人地址: JPX Osaka
- 专利权人: Sumitomo Chemical Co., Ltd.
- 当前专利权人: Sumitomo Chemical Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX1-231165 19890905
- 主分类号: G03F7/022
- IPC分类号: G03F7/022 ; G03F7/023 ; G03F7/32
摘要:
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: ##STR1## wherein R is a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, and n is a number of 0 to 3, which has good sensitivity, improved resolution and heat resistance.
公开/授权文献
- USD371981S Ring 公开/授权日:1996-07-23