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20 条记录 (耗时 0.014 秒)

    Positive resist composition
    1.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US06383708B1

    公开(公告)日：2002-05-07

    申请号：US08160290

    申请日：1993-12-02

    申请人： Yasunori Uetani ,  Yasunori Doi ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki ,  Ryotaro Hanawa

    发明人： Yasunori Uetani ,  Yasunori Doi ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki ,  Ryotaro Hanawa

    IPC分类号： G03C152

    CPC分类号： G03F7/0048 ,  G03F7/0226

    摘要： A positive resist composition comprising, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of (B) at least one organic solvent selected from the group consisting of &ggr;-butyrolactone, 3-methoxybutanol and cyclohexanone and (A) an organic solvent other than the solvents (B) which does not have simultaneously an alkylcarbonyl group and an alkoxy group in a molecule and has a boiling point of from 140 to 180° C. under atmospheric pressure (B), which composition has a large &ggr;-value and provides an improved profile and a large depth of focus.

    摘要翻译： 一种正性抗蚀剂组合物，其包含碱溶性树脂，醌二叠氮化合物和（B）至少一种选自γ-丁内酯，3-甲氧基丁醇和环己酮的至少一种有机溶剂和（A ）除了在大气压（B）下在分子中不具有烷基羰基和烷氧基并且沸点为140〜180℃的溶剂（B）的有机溶剂，该组合物具有 大的伽马值，并提供改进的轮廓和较大的焦点深度。

    Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
    2.
    发明授权
    Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound 失效
    包含1,2-醌二叠氮化合物，碱溶性树脂和多酚化合物的辐射敏感性正性抗蚀剂组合物

    公开(公告)号：US5861229A

    公开(公告)日：1999-01-19

    申请号：US948466

    申请日：1992-09-22

    申请人： Haruyoshi Osaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    发明人： Haruyoshi Osaki ,  Fumio Oi ,  Yasunori Uetani ,  Makoto Hanabata ,  Takeshi Hioki

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:X--.alpha.--H (I)wherein x is a group of the formula: ##STR1## and .alpha. is a divalent group which comprises a repeating unit of the formula: ##STR2## in which n is a number of not less than 1; a, b, c, d, e and f are the same or different and a number of 0-3, provided that d+f is not less than 1; R.sub.1, R.sub.2 and R.sub.3 are the same or different and a C.sub.1 -C.sub.18 alkyl group, a C.sub.1 -C.sub.18 alkoxy group, a carboxyl group or a halogen atom; R.sub.4 is a hydrogen atom, a C.sub.1 -C.sub.18 alkyl group or an aryl group, which resist composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.

    摘要翻译： 一种正性抗蚀剂组合物，其包含1,2-醌二叠氮化合物和含有下列通式的多酚化合物（I）的碱溶性树脂：X-α-H（I），其中x是下式的基团： 并且α是包含下式的重复单元的二价基团：其中n是不小于1的数目：或 a，b，c，d，e和f相同或不同，数目为0-3，条件是d + f不小于1; R1，R2和R3相同或不同，C1-C18烷基，C1-C18烷氧基，羧基或卤原子; R4是氢原子，C1-C18烷基或芳基，其抗蚀剂组成对辐射敏感，并具有良好的灵敏度，分辨能力和耐热性的平衡。

    Succinimide derivative, process for production and use thereof
    6.
    发明授权
    Succinimide derivative, process for production and use thereof 失效
    琥珀酰亚胺衍生物，其制备方法和用途

    公开(公告)号：US5965748A

    公开(公告)日：1999-10-12

    申请号：US54476

    申请日：1998-04-03

    申请人： Akira Kamabuchi ,  Naoki Takeyama ,  Jun Tomioka ,  Haruyoshi Osaki

    发明人： Akira Kamabuchi ,  Naoki Takeyama ,  Jun Tomioka ,  Haruyoshi Osaki

    IPC分类号： C07D207/46

    CPC分类号： C07D207/46 ,  Y02P20/55

    摘要： N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.

    摘要翻译： 提供由式（I）表示的N-（10-樟脑磺酰氧基） - 琥珀酰亚胺，其可以通过N-羟基琥珀酰亚胺与10-樟脑磺酸，其盐或其卤化物反应制备。 使用该化合物作为酸发生剂，可以通过包括具有通过酸的作用除去的保护基的碱溶性树脂来获得抗蚀剂组合物; 并且抗蚀剂组合物具有优异的耐热性，显影后的残留膜厚度的比例，膜厚度的均匀性，轮廓，感光度和分辨率，并且在时间延迟效应和图案的附着方面得到改善。

    Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
    7.
    发明授权
    Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
    包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物

    公开(公告)号：US5736292A

    公开(公告)日：1998-04-07

    申请号：US490511

    申请日：1995-06-14

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

    Positive resist composition and photosensitizers
    8.
    发明授权
    Positive resist composition and photosensitizers 失效
    正抗蚀剂组合物和光敏剂

    公开(公告)号：US5866724A

    公开(公告)日：1999-02-02

    申请号：US733166

    申请日：1996-10-17

    申请人： Koji Ichikawa ,  Haruyoshi Osaki ,  Hiroki Inoue

    发明人： Koji Ichikawa ,  Haruyoshi Osaki ,  Hiroki Inoue

    IPC分类号： C07C39/15 ,  C07C39/17 ,  C07C309/71 ,  G03F7/022 ,  C07C309/76

    CPC分类号： G03F7/022 ,  C07C309/71 ,  C07C39/15 ,  C07C39/17 ,  C07C2101/16 ,  C07C2102/10

    摘要： A positive photoresist compositions comprising, as a photosensitizer, a quinonediazide sulfonic acid ester of a phenol compound represented by the following formula (I): ##STR1## wherein Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, Q.sup.5, Q.sup.6, Q.sup.7, Q.sup.8, Q.sup.9 and Q.sup.10 independently represent hydrogen, alkyl having 1-6 carbon atoms or phenyl, or Q.sup.1 and Q.sup.2, Q.sup.3 and Q.sup.4, Q.sup.5 and Q.sup.6, Q.sup.7 and Q.sup.8, or Q.sup.9 and Q.sup.10 may form a cycloalkane ring having 6 or less carbon atoms together with a carbon atoms to which they are connected, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13, R.sup.14, R.sup.15 and R.sup.16 independently represent hydrogen, hydroxyl, alkyl having 1-6 carbon atoms or phenyl; andm and n independently represent a number of 0 or 1;and an alkali soluble resin;and a quinonediazide sulfonic acid ester of a phenol compound of formula (I).

    摘要翻译： 一种正型光致抗蚀剂组合物，其包含作为光敏剂的由下式（I）表示的酚化合物的醌二叠氮磺酸酯：其中Q1，Q2，Q3，Q4，Q5，Q6，Q7， Q8，Q9和Q10独立地表示氢，具有1-6个碳原子的烷基或苯基，或Q1和Q2，Q3和Q4，Q5和Q6，Q7和Q8或Q9和Q10可以形成具有6个或更少碳的环烷烃环 R1，R2，R3，R4，R5，R6，R7，R8，R9，R10，R11，R12，R13，R14，R15和R16独立地表示氢，羟基，烷基 具有1-6个碳原子或苯基; m和n独立地表示0或1的数; 和碱溶性树脂; 和式（I）的酚化合物的醌二叠氮化物磺酸酯。

    Positive resist composition
    9.
    发明授权
    Positive resist composition 失效
    正抗蚀剂组成

    公开(公告)号：US5843616A

    公开(公告)日：1998-12-01

    申请号：US419604

    申请日：1995-04-10

    申请人： Kunishige Edamatsu ,  Yuji Yoshida ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki

    发明人： Kunishige Edamatsu ,  Yuji Yoshida ,  Kazuhiko Hashimoto ,  Haruyoshi Osaki

    IPC分类号： G03F7/022 ,  C08G8/24 ,  G03F7/004 ,  G03F7/023 ,  H01L21/027

    CPC分类号： C08G8/24 ,  G03F7/0236

    摘要： A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises; an o-quinonediazide compound; and a novolac resin(1) obtained by allowing an aromatic aldehyde of the formula(I) ##STR1## wherein R.sub.4 to R.sub.6 represents hydrogen, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, k'0 represents an integer not smaller than 0 and p represents 1, 2 or 3, to react with a phenol compound of the formula (II) ##STR2## wherein R.sub.7 to R.sub.9 represents hydrogen, hydroxy, alkyl, cycloalkyl, alkoxy, alkenyl or aryl, provided that at least one of R.sub.7 to R.sub.9 is cycloalkyl having 6 or less carbon atoms, in the presence of an acid catalyst to obtain a reaction product(1) containing low molecular weight ingredients; and, then, allowing the reaction product(1) to further react with a phenol compound(1) and formaldehyde.

    摘要翻译： 对紫外线，远紫外线等辐射敏感的正性抗蚀剂组合物，其包含： 邻醌二叠氮化合物; 和通过使式（I）的芳香醛（I）得到的酚醛清漆树脂（1），其中R4至R6表示氢，烷基，环烷基，烷氧基，烯基或芳基，k'0表示不小于 与式（II）的酚化合物反应，其中R 7至R 9表示氢，羟基，烷基，环烷基，烷氧基，烯基或芳基，条件是 在酸催化剂的存在下，R7至R9中的至少一个是具有6个或更少个碳原子的环烷基，得到含有低分子量成分的反应产物（1）; 然后使反应产物（1）进一步与酚化合物（1）和甲醛反应。