发明授权
- 专利标题： Ablation mask and use thereof
- 专利标题（中）： 消融面罩及其用途
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申请号： US996877申请日： 1992-12-28
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公开(公告)号： US5298351A公开(公告)日： 1994-03-29
- 发明人: Norman Bobroff , Alan E. Rosenbluth
- 申请人： Norman Bobroff , Alan E. Rosenbluth
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F1/38 ; G03F1/58 ; H01L21/027 ; H01L21/30 ; H01L21/302 ; G03F9/00
摘要：
An ablation mask that includes a transparent substrate having a patterned layer located between two dielectric transparent material coatings thereon is provided. Also, the ablation mask is useful in dry etching processes to provide patterned layers, and other laser processing applications that require high fluence such as photodeposition, thin film transfer and thin film release.
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