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公开(公告)号：US11633903B2
公开(公告)日：2023-04-25
申请号：US17723557
申请日：2022-04-19
申请人： LG Chem, Ltd.
发明人： Cheol Ock Song , Seung Heon Lee , Ji Young Hwang , Han Min Seo , Nam Seok Bae , Jin Woo Park , Jung Sun You
IPC分类号： B29C59/02 , B29C59/04 , G02F1/1339 , G02F1/1347 , G02F1/1335 , G02F1/1362 , G03F1/58
摘要： A substrate and a method for producing the same are disclosed herein. In some embodiments, a substrate includes a base layer, a black layer formed on the base layer, and column spacers formed on the black layer, wherein a loss rate of spacers measured by a peel test is 15% or less. The substrate can have excellent adhesiveness of the spacer to the base layer or the black layer and ensuring appropriate darkening properties. The method can effectively produce such a substrate without adverse effects such as occurrence of foreign materials without separate treatment such as heat treatment.
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公开(公告)号：US11579493B2
公开(公告)日：2023-02-14
申请号：US16795425
申请日：2020-02-19
发明人： Dong Hee Shin
IPC分类号： H01L51/52 , G02F1/1339 , H01L27/12 , G03F1/58 , G03F1/42 , G02F1/1345 , G02F1/1368
摘要： A display device includes: a display area including a plurality of pixels; a first peripheral area disposed at one side of the display area; and a second peripheral area disposed at the opposite side of the display area, wherein a first column spacer is disposed in the display area, a second column spacer is disposed in the first peripheral area, and a third column spacer is disposed in the second peripheral area. The patterns of an exposure mask utilized in the first peripheral area in which the second column spacer is disposed and the second peripheral area in which the third column spacer is disposed may be different from each other.
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公开(公告)号：US20220342293A1
公开(公告)日：2022-10-27
申请号：US17761100
申请日：2020-09-23
申请人： HOYA CORPORATION
发明人： Masanori NAKAGAWA
摘要： Provided is a substrate with a multilayer reflective film, the substrate being used for manufacturing a reflective mask blank and a reflective mask each having a multilayer reflective film having a high reflectance to exposure light and a low background level during defect inspection.
A substrate with a multilayer reflective film 110 comprises a substrate 1 and a multilayer reflective film 5. The multilayer reflective film 5 is formed of a multilayer film in which a low refractive index layer and a high refractive index layer are alternately layered on the substrate 1. The multilayer reflective film 5 comprises at least one additive element selected from hydrogen (H), deuterium (D), and helium (He). The additive element in the multilayer reflective film 5 has an atomic number density of 0.006 atom/nm3 or more and 0.50 atom/nm3 or less.-
公开(公告)号：US11372325B2
公开(公告)日：2022-06-28
申请号：US16461372
申请日：2018-10-23
发明人： En-Tsung Cho
IPC分类号： G03F1/58
摘要： This application discloses a mask and a manufacture method thereof, including: a full shielding area, made of a light shielding material; a semi-transparent area, where there is at least one semi-transparent area and the semi-transparent area allows transmission of partial light, and a main body of the semi-transparent area is made of semi-transparent films, and full shielding structures are arranged in the semi-transparent films.
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公开(公告)号：US11327393B2
公开(公告)日：2022-05-10
申请号：US16866144
申请日：2020-05-04
发明人： Takuro Kosaka , Yukio Inazuki , Hideo Kaneko
摘要： A photomask blank comprising a transparent substrate and a light-shielding film disposed thereon is provided. The light-shielding film is constructed by a single layer or multiple layers including a light-shielding layer containing Si and N, having a N content of 3-50 at % based on the sum of Si and N, being free of a transition metal.
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公开(公告)号：US11307492B2
公开(公告)日：2022-04-19
申请号：US17101595
申请日：2020-11-23
发明人： Shih-Ming Chang , Minfeng Chen , Min-An Yang , Shao-Chi Wei
摘要： A method for forming a photomask is provided. The method includes forming a light blocking layer over a transparent substrate. The light blocking layer has a first portion, a second portion, and a connection portion. The method includes forming a mask layer over the first portion and the second portion of the light blocking layer. The method includes removing the connection portion. The method includes removing the mask layer. The second portion of the light blocking layer is removed during removing the mask layer, while the first portion remains. The method includes after removing the mask layer and the second portion, removing the third portion of the transparent substrate to form a first recess in the transparent substrate. The method includes forming a light blocking structure in the first recess.
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公开(公告)号：US20220082925A1
公开(公告)日：2022-03-17
申请号：US17227717
申请日：2021-04-12
发明人： Vibhu Jindal
摘要： Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
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公开(公告)号：US20210397076A1
公开(公告)日：2021-12-23
申请号：US17173245
申请日：2021-02-11
发明人： Sanghyun KIM , Jinho JEON
IPC分类号： G03F1/24 , G03F1/58 , G03F1/60 , H01L21/033
摘要： A reticle in an apparatus for extreme ultraviolet (EUV) exposure includes a substrate having an image area and a black border area surrounding the image area, a multi-layer structure on the image area and the black border area of the substrate, the multi-layer structure to reflect EUV light, a capping layer covering the multi-layer structure, first absorber layer patterns on the capping layer in the image area and the black border area, and an absorber structure on the capping layer in the black border area, the absorber structure including one of the first absorber layer patterns, a hard mask pattern, and a second absorber layer pattern sequentially stacked, the absorber structure covering an entire upper surface of the capping layer in the black border area.
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公开(公告)号：US11086225B2
公开(公告)日：2021-08-10
申请号：US16887245
申请日：2020-05-29
发明人： Wei-Shin Cheng , Hsin-Feng Chen , Cheng-Hao Lai , Shao-Hua Wang , Han-Lung Chang , Li-Jui Chen , Po-Chung Cheng
摘要： A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
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10.发明授权公开(公告)号：US11086215B2
公开(公告)日：2021-08-10
申请号：US16019754
申请日：2018-06-27
发明人： Yun-Yue Lin , Hsin-Chang Lee
摘要： A reticle and a method for manufacturing a reticle are provided. The method includes forming a reflective multilayer (ML) over a front-side surface of a mask substrate. The method further includes forming a capping layer over the reflective ML. The method further includes forming a sacrificial multilayer over the capping layer. The method further includes forming an opening in the sacrificial multilayer to expose the capping layer. The method further includes forming a first absorption layer over the sacrificial multilayer and covering the capping layer in the opening. The method further includes removing the first absorption layer outside the opening in the sacrificial multilayer to form a first absorption pattern on a portion of the capping layer.
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