发明授权
- 专利标题： Processes for preparing hydrogen gas and determining ratio of masses between hydrogen isotopes therein
- 专利标题（中）： 制备氢气的方法和确定其中氢同位素质量之比
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申请号： US863717申请日： 1992-04-03
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公开(公告)号： US5300276A公开(公告)日： 1994-04-05
- 发明人: Akira Ueda , Yasuhiro Kubota , Tsutomu Araki
- 申请人： Akira Ueda , Yasuhiro Kubota , Tsutomu Araki
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Materials Corporation
- 当前专利权人： Mitsubishi Materials Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX3-71918 19910404; JPX3-80206 19910412
- 主分类号： C01B3/06
- IPC分类号： C01B3/06 ; C01B4/00 ; H01J49/04 ; C01B3/08
摘要：
The present invention relates to a process for preparing hydrogen gas from the reduction of water, and also relates to a process for determining the ratio of the masses between hydrogen isotopes in the obtained hydrogen gas. The invention provides a process of preparing hydrogen gas comprising steps of: (i) preparing zinc metal particles having a size approximately in the range of 1 mm-2 mm by dropping a mixture of a selected amount of liquified zinc metal and 10 to 10000 ppm of nickel elements into a water bath; and (ii) reacting a sample of water with zinc metal particles at a selected reaction temperature to perform the reduction reaction of the water. The invention also provides a process of determining the ratio of the masses between hydrogen isotopes, .sup.1 H and .sup.2 H, in a sample of water. This process comprises a step of preparing hydrogen gas from the sample by the novel method described above.
公开/授权文献
- US5856229A Process for production of semiconductor substrate 公开/授权日：1999-01-05
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