发明授权
US5304797A Gas analyzer for determining impurity concentration of highly-purified
gas
失效
气体分析仪,用于确定高纯度气体的杂质浓度
- 专利标题: Gas analyzer for determining impurity concentration of highly-purified gas
- 专利标题(中): 气体分析仪,用于确定高纯度气体的杂质浓度
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申请号: US16534申请日: 1993-02-11
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公开(公告)号: US5304797A公开(公告)日: 1994-04-19
- 发明人: Takashi Irie , Yasuhiro Mitsui , Keiji Hasumi
- 申请人: Takashi Irie , Yasuhiro Mitsui , Keiji Hasumi
- 申请人地址: JPX Tokyo JPX Tokyo
- 专利权人: Hitachi, Ltd.,Hitachi Tokyo Electronics, Co., Ltd.
- 当前专利权人: Hitachi, Ltd.,Hitachi Tokyo Electronics, Co., Ltd.
- 当前专利权人地址: JPX Tokyo JPX Tokyo
- 优先权: JPX4-041330 19920227
- 主分类号: G01N27/62
- IPC分类号: G01N27/62 ; H01J49/04 ; H01J49/40
摘要:
Ultra-low concentrations of impurities such as water in a highly-purified gas are analyzed by a system having an ion source chamber and a drift chamber. The ion source chamber ionizes one of a sample gas and a carrier gas to produce main component ions, and the other of the sample gas and carrier gas is introduced into the drift chamber. The invention controls the residence time of main component ions in one of the first and second chambers to be shorter than the mean reaction time of main component ions and impurity molecules of the sample gas in the one of the first and second chambers.
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