公开(公告)号：US5304797A

公开(公告)日：1994-04-19

申请号：US16534

申请日：1993-02-11

申请人： Takashi Irie ,  Yasuhiro Mitsui ,  Keiji Hasumi

发明人： Takashi Irie ,  Yasuhiro Mitsui ,  Keiji Hasumi

IPC分类号： G01N27/62 ,  H01J49/04 ,  H01J49/40

CPC分类号： H01J49/0422

摘要： Ultra-low concentrations of impurities such as water in a highly-purified gas are analyzed by a system having an ion source chamber and a drift chamber. The ion source chamber ionizes one of a sample gas and a carrier gas to produce main component ions, and the other of the sample gas and carrier gas is introduced into the drift chamber. The invention controls the residence time of main component ions in one of the first and second chambers to be shorter than the mean reaction time of main component ions and impurity molecules of the sample gas in the one of the first and second chambers.

摘要翻译： 通过具有离子源室和漂移室的系统来分析高纯度气体中的超低浓度杂质如水。 离子源室离子化样品气体和载气中的一种以产生主要成分离子，另一种样品气体和载气被引入漂移室。 本发明控制主要成分离子在第一和第二室之一中的停留时间短于第一和第二室中的一个中的主要成分离子和样品气体的杂质分子的平均反应时间。

公开(公告)号：US5482524A

公开(公告)日：1996-01-09

申请号：US285421

申请日：1994-08-03

申请人： Kazuo Nakano ,  Kazuaki Mizokami ,  Keiji Hasumi ,  Katsuhiko Itoh ,  Michimasa Funabashi ,  Yasuhiro Mitsui ,  Takashi Irie ,  Takeshi Tajima ,  Sadao Matsuoka

发明人： Kazuo Nakano ,  Kazuaki Mizokami ,  Keiji Hasumi ,  Katsuhiko Itoh ,  Michimasa Funabashi ,  Yasuhiro Mitsui ,  Takashi Irie ,  Takeshi Tajima ,  Sadao Matsuoka

IPC分类号： G01N1/02 ,  G01N1/00 ,  G01N1/22 ,  G01N1/28 ,  G01N30/00 ,  H01L21/324 ,  H01L21/66 ,  B01D53/04 ,  B01D35/18

CPC分类号： G01N30/00 ,  G01N1/2214 ,  G01N2001/2264 ,  G01N2030/008

摘要： An atmospheric pressure, elevated temperature gas desorption apparatus which enables quanitiative analysis of impurities absorbed in or on the surface of a solid sample (semiconductor wafer, optical disc, etc.) is disclosed. The atmospheric pressure, elevated temperature gas desorption apparatus for desorbing impurities absorbed in or on the surface of a plate-like solid sample 18 into a carrier gas 19 in a chamber 6 under an atmospheric pressure while increasing the temperature of the solid sample 18 includes a desorption room 7A provided in the chamber 6 and connected through to a first gas supply system 1 for supplying the carrier gas 19, for desorbing impurities absorbed in or on the surface of the solid sample 18 into the carrier gas 19. A sample support room 7B is provided in the chamber 6 and is separated from the desorption room 7A by a partition member 6A. The solid sample 18 is in close contact with the partition member 6A. A heater 8 for heating the solid sample 18 is in close contact with the partition member 6A. A reserve room 9 is connected to the sample support room 7B and to a second gas supply system 13 for supplying a purge gas.

摘要翻译： 公开了一种大气压高温气体解吸装置，其能够对固体样品（半导体晶片，光盘等）表面中或表面上吸收的杂质进行量化分析。 吸附在板状固体样品18中的表面上或其上的杂质的大气压高温气体解吸装置在大气压下在室6中的载气19中同时增加固体样品18的温度包括 解吸室7A设置在室6中，并连接到用于供给载气19的第一气体供应系统1，用于将吸收在固体样品18中或其表面上的杂质解吸到载体气体19中。样品支撑室7B 设置在室6中，并通过分隔构件6A与解吸室7A分离。 固体样品18与分隔构件6A紧密接触。 用于加热固体样品18的加热器8与分隔构件6A紧密接触。 预备室9连接到样品支撑室7B和用于供给吹扫气体的第二气体供给系统13。

公开(公告)号：US4996422A

公开(公告)日：1991-02-26

申请号：US360107

申请日：1989-06-01

申请人： Yasuhiro Mitsui ,  Keiji Hasumi ,  Shinichiro Watase ,  Katsumi Kuriyama ,  Kazuo Nakano

发明人： Yasuhiro Mitsui ,  Keiji Hasumi ,  Shinichiro Watase ,  Katsumi Kuriyama ,  Kazuo Nakano

IPC分类号： H01J49/06 ,  H01J49/02 ,  H01J49/26

CPC分类号： H01J49/025

摘要： A mass spectrometer, including an evacuable vessle, mass separation means provided in the evacuable vessel for separating ions in accordance with the mass thereof, and ion detection means provided in the evacuable vessel for detecting ions emitted from the mass separation means to convert the emitted ions into an electric signal, in which the ion detection means includes an electron-multiplier for detecting positive ions and a photo-multiplier for detecting negative ions. According to this mass spectrometer, positive ions can be detected at high sensitivity, and negative ions are readily detected.

公开(公告)号：US5744800A

公开(公告)日：1998-04-28

申请号：US477654

申请日：1995-06-07

申请人： Hiroshi Kakibayashi ,  Hisaya Murakoshi ,  Hidekazu Okuhira ,  Takashi Irie ,  Jiro Tokita ,  Keiichi Kanehori ,  Yasuhiro Mitsui

发明人： Hiroshi Kakibayashi ,  Hisaya Murakoshi ,  Hidekazu Okuhira ,  Takashi Irie ,  Jiro Tokita ,  Keiichi Kanehori ,  Yasuhiro Mitsui

IPC分类号： H01J37/20 ,  H01J37/26

CPC分类号： H01J37/26 ,  H01J2237/2617

摘要： A transmission electron microscope makes it possible to search for defects without applying an undesirable treatment to a specimen by using a reference specimen prepared separately from a specimen to be observed. A pair of specimen holders detachable from the column of the electron microscope are adjacently arranged at upper and lower stages respectively along an electron beam axis to position the specimens closely to each other in an electron beam illuminating position. The pair of holders can be independently set to or removed from the electron beam illuminating position. The specimen holders include devices for selectively finely adjusting the spacing between the specimens, the angle of the specimen with respect to the electron beam axis and with respect to a plane perpendicular to the electron beam axis.

摘要翻译： 透射电子显微镜使得可以通过使用与要观察的样品分开制备的参考样品，来对样品进行不期望的处理来搜索缺陷。 从电子显微镜柱分离的一对试样支架分别沿着电子束轴相邻地设置在上部和下部阶段，以使电极在照射位置彼此紧密地定位。 该对保持器可以独立地设置在电子束照明位置或从电子束照射位置移除。 样品架包括用于选择性地精细调节样品之间的间距，样品相对于电子束轴线的角度和相对于垂直于电子束轴线的平面的角度的装置。

公开(公告)号：US5485016A

公开(公告)日：1996-01-16

申请号：US231847

申请日：1994-04-25

申请人： Takashi Irie ,  Yasuhiro Mitsui ,  Kazuaki Mizokami ,  Katsumi Kuriyama

发明人： Takashi Irie ,  Yasuhiro Mitsui ,  Kazuaki Mizokami ,  Katsumi Kuriyama

IPC分类号： G01N27/62 ,  H01J49/04 ,  H01J49/10 ,  H01J49/26

CPC分类号： H01J49/168 ,  H01J49/0422 ,  H01J49/145

摘要： A mass spectrometer for analyzing trace impurities on a level between ppt and ppb contained in silicon material gas such as monosilane gas. The mass spectrometer includes an ion formation region, reaction region, and mass analysis region. Ion formation gas is introduced into the ion formation region and sample gas (silicon material gas) is introduced into the reaction region. The ion formation region ionizes ion formation gas by an ionizer and forms primary ions. When the pressure of ion formation gas is made higher than the pressure of sample gas, the ion formation gas flows into the reaction region from the ion formation region together with primary ions and is mixed with the sample gas. In the reaction region, an ion-molecule reaction is produced between the primary ions and trace impurities contained in the sample gas and the trace impurities contained in the sample gas are ionized. The ion intensity of trace impunities, the concentration of trace impurities in the sample gas is determined using a calibration curve. When the gas pressure in the reaction region is kept at almost 1 atmosphere, the reaction is promoted and when the ion-molecule reaction time is optimized according to the size of the reaction region and the voltage condition, impurities on a level between ppt and ppb can be detected and determined.

摘要翻译： 用于分析硅材料气体（如硅烷气体）中含有的ppt和ppb之间的痕量杂质的质谱仪。 质谱仪包括离子形成区域，反应区域和质量分析区域。 将离子形成气体引入离子形成区域，并将样品气体（硅材料气体）引入反应区域。 离子形成区域通过离子发生器离子化形成气体并形成初级离子。 当离子形成气体的压力高于样品气体的压力时，离子形成气体与一次离子一起从离子形成区域流入反应区域，并与样品气体混合。 在反应区域中，在原料离子和样品气体中含有的微量杂质之间产生离子分子反应，并将样品气体中所含的痕量杂质离子化。 使用校准曲线确定痕量缺陷的离子强度，样品气体中微量杂质的浓度。 当反应区域的气体压力保持在大致1气道时，促进反应，当根据反应区域的大小和电压条件优化离子分子反应时间时，ppt与ppb之间的杂质 可以被检测和确定。

公开(公告)号：US08713758B2

公开(公告)日：2014-05-06

申请号：US13698095

申请日：2011-05-02

申请人： Yasuhiro Mitsui ,  Hironobu Sayama

发明人： Yasuhiro Mitsui ,  Hironobu Sayama

IPC分类号： E05D11/06

CPC分类号： H04M1/0237 ,  G06F1/1615 ,  H04M1/0216 ,  Y10T16/544 ,  Y10T16/5448 ,  Y10T74/18944

摘要： An opening/closing device includes a fixed plate, a moving plate movable relative to the fixed plate, a slide plate formed having a groove, a hinge including a first shaft connected to the fixed plate, a third shaft connected to the moving plate, and a second shaft between the first and third shafts, and moves the moving plate between closed and open positions relative to the fixed plate, a slide arm including a fourth shaft connected to the moving plate and a fifth shaft connected slidably along the groove, and moves the moving plate between the closed and open positions, a link arm having one end connected to the second shaft and the other to the fifth shaft. The fifth shaft slides inside the groove as the link arm moves along with the moving of the hinge when the moving plate is moved between the closed and open positions.

摘要翻译： 开闭装置包括固定板，相对于固定板可移动的移动板，形成有槽的滑动板，包括连接到固定板的第一轴的铰链，连接到移动板的第三轴，以及 在第一和第三轴之间的第二轴，并且使移动板相对于固定板在关闭和打开位置之间移动，包括连接到移动板的第四轴的滑动臂和沿着凹槽可滑动地连接的第五轴， 所述移动板在所述闭合位置和打开位置之间，连杆臂的一端连接到所述第二轴，而另一端连接到所述第五轴。 当移动板在关闭位置和打开位置之间移动时，连杆臂随着铰链的移动而移动，第五轴在凹槽内滑动。

公开(公告)号：US08618520B2

公开(公告)日：2013-12-31

申请号：US13547942

申请日：2012-07-12

申请人： Mitsuo Tokuda ,  Muneyuki Fukuda ,  Yasuhiro Mitsui ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Hideo Kashima ,  Kaoru Umemura

发明人： Mitsuo Tokuda ,  Muneyuki Fukuda ,  Yasuhiro Mitsui ,  Hidemi Koike ,  Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Hideo Kashima ,  Kaoru Umemura

IPC分类号： G21K5/00

CPC分类号： H04L29/06 ,  G01N23/225 ,  H01J37/256 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/31745 ,  H04L67/16 ,  H04L69/329

摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

公开(公告)号：US20130156354A1

公开(公告)日：2013-06-20

申请号：US13818730

申请日：2011-08-29

申请人： Yasuhiro Mitsui

发明人： Yasuhiro Mitsui

IPC分类号： H04M1/02

CPC分类号： H04M1/0235 ,  G06F1/1624 ,  H04M1/0237

摘要： A sliding device for an electronic apparatus includes a contact piece projecting outward in a widthwise direction from a sliding plate and a contacted part with which the contact piece is caused to come into contact when the sliding plate is caused to slide with a maximum displacement in a rear direction relative to a base plate. The contact piece includes a partially cylindrical surface and a connecting surface. The contacted part includes a contacted shape part configured to be contacted by a boundary part of the partially cylindrical surface and the connecting surface to provide the sliding plate with a rotational force to cause a front direction end portion of the sliding plate to move in the bottom direction relative to a rear direction end portion of the sliding plate, and an engaged shape part with which the partially cylindrical surface and the connecting surface are caused to engage.

摘要翻译： 一种用于电子设备的滑动装置，包括从滑动板沿宽度方向向外突出的接触片和当滑动板以最大位移滑动时使接触片接触的接触部分 相对于基板的后方向。 接触件包括部分圆柱形表面和连接表面。 接触部分包括接触形状部分，其被构造成与部分圆柱形表面的边界部分和连接表面接触，以向滑动板提供旋转力，以使滑板的前方端部在底部移动 相对于滑动板的后方端部的方向，以及与部分圆筒形表面和连接表面接合的接合形状部分。

公开(公告)号：US20100116986A1

公开(公告)日：2010-05-13

申请号：US12691331

申请日：2010-01-21

申请人： Tomoharu Obuki ,  Hiroshi Toyama ,  Yasuhiro Mitsui ,  Munetoshi Fukui ,  Yasuhiko Nara ,  Tohru Ando ,  Katsuo Ooki ,  Tsutomu Saito ,  Masaaki Komori

发明人： Tomoharu Obuki ,  Hiroshi Toyama ,  Yasuhiro Mitsui ,  Munetoshi Fukui ,  Yasuhiko Nara ,  Tohru Ando ,  Katsuo Ooki ,  Tsutomu Saito ,  Masaaki Komori

IPC分类号： G01N23/225

CPC分类号： G01N23/225 ,  H01J2237/2449 ,  H01J2237/24564 ,  H01J2237/2817

摘要： An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency.In the present invention, a plurality of probes are brought in contact with a specimen. While irradiating the specimen with an electron beam, currents flowing in the probes are measured. Signals from at least two probes are input to a differential amplifier. An output of the differential amplifier is amplified. On the basis of the amplified output and scanning information of the electron beam, an absorbed current image is generated. According to the invention, a clear absorbed current image can be obtained without involving the difference in gain of amplifier between inputs. Thus, measurement efficiency in a failure analysis of a semiconductor device can be improved.

摘要翻译： 本发明的目的是获得清晰的吸收电流图像，而不涉及放大器在输入之间的增益差异，从吸收的电流通过使用多个探针检测并提高测量效率。 在本发明中，使多个探针与试样接触。 在用电子束照射样品的同时，测量在探针中流动的电流。 至少两个探头的信号被输入到差分放大器。 差分放大器的输出被放大。 基于电子束的放大输出和扫描信息，产生吸收的当前图像。 根据本发明，可以获得清晰的吸收电流图像而不涉及放大器在输入之间的增益差。 因此，可以提高半导体器件的故障分析中的测量效率。

公开(公告)号：US5877498A

公开(公告)日：1999-03-02

申请号：US893034

申请日：1997-07-15

申请人： Aritoshi Sugimoto ,  Yoshimi Sudo ,  Tokuo Kure ,  Ken Ninomiya ,  Katsuhiro Kuroda ,  Takashi Nishida ,  Hideo Todokoro ,  Yasuhiro Mitsui ,  Hiroyasu Shichi

发明人： Aritoshi Sugimoto ,  Yoshimi Sudo ,  Tokuo Kure ,  Ken Ninomiya ,  Katsuhiro Kuroda ,  Takashi Nishida ,  Hideo Todokoro ,  Yasuhiro Mitsui ,  Hiroyasu Shichi

IPC分类号： G01N23/225 ,  H01J37/256

CPC分类号： G01N23/2252 ,  H01J2237/2445 ,  H01J2237/2807

摘要： An X-ray analyzing method for inspecting opening states of fine holes comprises the steps of: irradiating a finely converged electron beam into a first fine hole, observing an X-ray emitted from the inside of said first fine hole in order to obtain an first X-ray analysis data about the residue substance existing at the bottom of said first fine hole; irradiating a finely converged electron beam into a second fine hole, observing an X-ray emitted from the inside of said second fine hole in order to obtain an second X-ray analysis data about the residue substance existing at the bottom of said second fine hole; and comparing said first X-ray analysis data with said second X-ray analysis data, forming a judgment as to whether or not a difference between said first and second analysis data is smaller than a predetermined threshold value and using an outcome of said judgment to determine the opening states of said first and second fine holes. The X-ray observations are carried out by detecting only the X-rays emitted within the angular range -.theta. to +.theta. where notation .theta. is an angle formed with a center axis of the irradiated electron beam and so defined that tan .theta. is equal to a/d whereas notations a and d are the radius and the depth of the fine holes.

摘要翻译： 用于检查细孔的打开状态的X射线分析方法包括以下步骤：将精细会聚的电子束照射到第一细孔中，观察从所述第一细孔的内部发射的X射线，以获得第一细孔 关于存在于所述第一细孔底部的残留物质的X射线分析数据; 将精细会聚的电子束照射到第二细孔中，观察从所述第二细孔的内部发射的X射线，以获得关于存在于所述第二细孔底部的残留物质的第二X射线分析数据 ; 以及将所述第一X射线分析数据与所述第二X射线分析数据进行比较，形成关于所述第一和第二分析数据之间的差是否小于预定阈值的判断，并且使用所述判断结果 确定所述第一和第二细孔的打开状态。 通过仅检测在角度范围θ至+θ内发射的X射线来进行X射线观察，其中符号θ是与照射的电子束的中心轴形成的角度，并且如此定义，tanθ等于 a / d，而符号a和d是细孔的半径和深度。