发明授权
- 专利标题: Thin film transistor with nitrogen concentration gradient
- 专利标题(中): 具有氮浓度梯度的薄膜晶体管
-
申请号: US070055申请日: 1993-06-01
-
公开(公告)号: US5311040A公开(公告)日: 1994-05-10
- 发明人: Masato Hiramatsu , Takaaki Kamimura , Mitsuo Nakajima
- 申请人: Masato Hiramatsu , Takaaki Kamimura , Mitsuo Nakajima
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX2-77385 19900327; JPX2-215491 19900815
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L29/45 ; H01L29/78 ; H01L29/786 ; H01L29/04 ; H01L29/167 ; H01L29/36 ; H01L29/76
摘要:
An inverted stagger thin film transistor includes an insulating substrate, a silicon active layer formed thereon, source and drain ohmic contact layers, source and drain electrodes respectively contacting the source and drain ohmic contact layers, and a gate electrode opposite to the channel region of the active layer through a gate insulating film. An auxiliary film consisting of a silicon film doped with nitrogen is formed in the surface of the active layer, and the ohmic contact layers contact the auxiliary film. The auxiliary film can be continuously formed from the active layer to the ohmic contact layers, thereby improving a junction state between the active layer and the ohmic contact layers.
公开/授权文献
- US6000736A Rotatable seal 公开/授权日:1999-12-14
信息查询
IPC分类: