发明授权
US5312685A Atomic oxygen protective coating with resistance to undercutting at
defect sites
失效
原子氧保护涂层，在缺陷部位具有抗切削性能
- 专利标题： Atomic oxygen protective coating with resistance to undercutting at defect sites
- 专利标题（中）： 原子氧保护涂层，在缺陷部位具有抗切削性能
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申请号： US909345申请日： 1992-07-06
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公开(公告)号： US5312685A公开(公告)日： 1994-05-17
- 发明人: Bruce A. Banks , Sharon K. Rutledge
- 申请人： Bruce A. Banks , Sharon K. Rutledge
- 申请人地址： DC Washington
- 专利权人： The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- 当前专利权人： The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- 当前专利权人地址： DC Washington
- 主分类号： B64G1/54
- IPC分类号： B64G1/54 ; C23C14/08 ; C23C14/20 ; B32B15/08
摘要：
Structures composed at least partially of an organic substrate may be protected from oxidation by applying a catalyst onto said substrate for promoting the combination of atomic oxygen to molecular oxygen. The structure may also be protected by applying both a catalyst and an atomic oxygen shielding layer onto the substrate. The structures to be protected include spacecraft surfaces.
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