公开(公告)号：US5560781A

公开(公告)日：1996-10-01

申请号：US439544

申请日：1995-05-08

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： B08B7/00 ,  B44D7/00

CPC分类号： B08B7/0035 ,  B44D7/00

摘要： The present invention discloses a method of removing organic protective coatings from a painting. In the present invention degraded protective coatings such as lacquers, acrylics, natural resins, carbons, soot, and polyurethane are safely removed from the surface of a painting without contact to the surface of the painting. This method can be used for restoration of paintings when they have been damaged, through age, fire, etc.

摘要翻译： 本发明公开了一种从油漆中除去有机保护涂层的方法。 在本发明中，将涂料，丙烯酸树脂，天然树脂，碳，烟灰和聚氨酯等降解的保护涂层从涂料的表面安全地除去而不与涂料的表面接触。 这种方法可以在通过年龄，火灾等损坏时用于修复绘画。

公开(公告)号：US5280174A

公开(公告)日：1994-01-18

申请号：US8026

申请日：1993-01-25

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： H05H3/02 ,  H05H3/00

CPC分类号： H05H3/02

摘要： Atomic oxygen atoms are routed to a material through a sufficiently tortuous path so that vacuum ultraviolet radiation is obstructed from arriving at the surface of the material. However, the material surface continues to be exposed to the atomic oxygen.

摘要翻译： 原子氧原子通过足够弯曲的路径被引导到材料，使得真空紫外线辐射被阻止到达材料的表面。 然而，材料表面继续暴露于原子氧。

公开(公告)号：US4620898A

公开(公告)日：1986-11-04

申请号：US775968

申请日：1985-09-13

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： H01J37/305 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06

CPC分类号： H01J37/3056

摘要： An ion beam etching process which forms extremely high aspect ratio surface microstructures using thin sputter masks is utilized in the fabrication of integrated circuits. A carbon rich sputter mask together with unmasked portions of a substrate is bombarded with inert gas ions while simultaneous carbon deposition is occurring. The arrival of the carbon deposit is adjusted to enable the sputter mask to have a near zero or even slightly positive increase in thickness with time while the unmasked portions have a high net sputter etch rate.

摘要翻译： 在集成电路的制造中使用使用薄溅射掩模形成极高纵横比的表面微结构的离子束蚀刻工艺。 在发生同时进行碳沉积的同时，用惰性气体离子轰击富含碳的溅射掩模以及衬底的未掩模部分。 调整碳沉积物的到来使得溅射掩模的厚度随着时间的推移接近零甚至略微正增加，而未掩模的部分具有高的净溅射蚀刻速率。

公开(公告)号：US5965076A

公开(公告)日：1999-10-12

申请号：US936492

申请日：1997-09-22

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： A61L27/28 ,  B29C33/38 ,  B29C33/42 ,  B29C33/40 ,  B05D1/12 ,  B05D1/32

CPC分类号： A61L27/28 ,  B29C33/42 ,  B29C33/3842 ,  Y10T156/11

摘要： A method for fabricating soft tissue implants using a mold. The cavity surface of an initially untextured mold, made of an organic material such as epoxy, is given a thin film coating of material that has pinholes and is resistant to atomic particle bombardment. The mold cavity surface is then subjected to atomic particle bombardment, such as when placed in an isotropic atomic oxygen environment. Microscopic depressions in the mold cavity surface are created at the pinhole sites on the thin film coating. The thin film coating is removed and the mold is then used to cast the soft tissue implant. The thin film coating having pinholes may be created by chilling the mold below the dew point such that water vapor condenses upon it; distributing particles, that can partially dissolve and become attached to the mold cavity surface, onto the mold cavity surface; removing the layer of condensate, such as by evaporation; applying the thin film coating over the entire mold surface; and, finally removing the particles, such as by dissolving or brushing it off. Pinholes are created in the thin film coating at the sites previously occupied by the particles.

摘要翻译： 一种使用模具制造软组织植入物的方法。 由诸如环氧树脂的有机材料制成的初始未纹理的模具的空腔表面被赋予具有针孔并具有抗原子粒子轰击的材料的薄膜涂层。 然后将模腔表面进行原子粒子轰击，例如当放置在各向同性的原子氧环境中时。 在薄膜涂层上的针孔位置产生模腔表面的微观凹陷。 去除薄膜涂层，然后将模具用于铸造软组织植入物。 具有针孔的薄膜涂层可以通过使模具在露点之下冷却来产生，使得水蒸气在其上冷凝; 将可以部分溶解并附着到模腔表面的颗粒分布到模腔表面上; 去除冷凝水层，例如通过蒸发; 将薄膜涂层涂覆在整个模具表面上; 并且最后除去颗粒，例如通过溶解或刷掉它们。 在先前由颗粒占据的位置处的薄膜涂层中产生针孔。

公开(公告)号：US5693241A

公开(公告)日：1997-12-02

申请号：US687116

申请日：1996-06-18

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： B08B7/00 ,  H05H1/48 ,  B23K15/00

CPC分类号： H05H1/48

摘要： A gas stream containing ionic and atomic oxygen in inert gas is used to remove organic matter from a substrate. The gas stream is formed by flowing a mixture of gaseous oxygen in an inert gas such as helium at atmospheric pressure past a high voltage, current limited, direct current arc which contacts the gas mixture and forms the ionic and atomic oxygen. The arc is curved at the cathode end and the ionic oxygen formed by the arc nearer to the anode end of the arc is accelerated in a direction towards the cathode by virtue of its charge. The relatively high mass to charge ratio of the ionic oxygen enables at least some of it to escape the arc before contacting the cathode and it is directed onto the substrate. This is useful for cleaning delicate substrates such as fine and historically important paintings and delicate equipment and the like.

摘要翻译： 使用在惰性气体中含有离子和原子氧的气流从底物中除去有机物质。 通过使气态氧在诸如氦气的惰性气体中的混合物在大气压下通过与气体混合物接触并形成离子和原子氧的高电压，电流限制的直流电流而形成。 电弧在阴极端弯曲，由靠近电弧阳极的电弧形成的离子氧通过其电荷在朝向阴极的方向上加速。 离子氧的相对较高的质荷比可使其至少一些在接触阴极之前逃离电弧并将其引导到基底上。 这对于清洁精细的基材例如精细和历史上重要的绘画和精美的设备等是有用的。

公开(公告)号：US5312685A

公开(公告)日：1994-05-17

申请号：US909345

申请日：1992-07-06

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： B64G1/54 ,  C23C14/08 ,  C23C14/20 ,  B32B15/08

CPC分类号： B64G1/54 ,  C23C14/08 ,  C23C14/20 ,  Y10T428/265 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31678 ,  Y10T428/31681 ,  Y10T428/31721

摘要： Structures composed at least partially of an organic substrate may be protected from oxidation by applying a catalyst onto said substrate for promoting the combination of atomic oxygen to molecular oxygen. The structure may also be protected by applying both a catalyst and an atomic oxygen shielding layer onto the substrate. The structures to be protected include spacecraft surfaces.

摘要翻译： 至少部分由有机底物构成的结构可以通过在所述基底上施加催化剂以促进原子氧与分子氧的组合来保护免受氧化。 还可以通过将催化剂和原子氧屏蔽层同时施加在基材上来保护结构。 要保护的结构包括航天器表面。

公开(公告)号：US5538766A

公开(公告)日：1996-07-23

申请号：US65794

申请日：1993-05-24

申请人： Bruce A. Banks ,  Sharon K. Rutledge

发明人： Bruce A. Banks ,  Sharon K. Rutledge

IPC分类号： B64G1/54 ,  C23C14/08 ,  C23C14/20 ,  B05D3/06

CPC分类号： B64G1/54 ,  C23C14/08 ,  C23C14/20 ,  Y10T428/265 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31678 ,  Y10T428/31681 ,  Y10T428/31721

摘要： Structures composed at least partially of an organic substrate are protected from oxidation by applying a catalyst onto said substrate for promoting the combination of atomic oxygen to molecular oxygen. The structure may also be protected by applying both a catalyst and an atomic oxygen shielding layer onto the substrate. The invention is useful for enhancing the protection of polymeric blankets, solar arrays and spacecraft surfaces in low earth orbit from cavities produced by atomic oxygen.

摘要翻译： 至少部分由有机基材组成的结构通过将催化剂施加到所述基材上以促进原子氧与分子氧的组合来保护免于氧化。 还可以通过将催化剂和原子氧屏蔽层同时施加在基材上来保护结构。 本发明可用于增强由原子氧产生的空穴中的低地球轨道中的聚合物毯，太阳能阵列和航天器表面的保护。