Invention Grant
- Patent Title: Method of manufacturing a semiconductor pressure sensor
- Patent Title (中): 制造半导体压力传感器的方法
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Application No.: US108498Application Date: 1993-08-18
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Publication No.: US5320705APublication Date: 1994-06-14
- Inventor: Tetsuo Fujii , Yoshitaka Gotoh , Susumu Kuroyanagi , Osamu Ina
- Applicant: Tetsuo Fujii , Yoshitaka Gotoh , Susumu Kuroyanagi , Osamu Ina
- Applicant Address: JPX Kariya
- Assignee: Nippondenso Co., Ltd.
- Current Assignee: Nippondenso Co., Ltd.
- Current Assignee Address: JPX Kariya
- Priority: JPX63-140676 19880608; JPX63-277119 19881101; JPX63-305061 19881201; JPX1-96872 19890417
- Main IPC: G01L9/00
- IPC: G01L9/00 ; H01L27/20 ; H01L21/306 ; B44C1/22 ; C03C15/00 ; C03C25/06
Abstract:
A semiconductor pressure sensor of this invention is intended to provide a semiconductor pressure sensor having an excellent electrical isolation between the supporting means of the semiconductor pressure sensor and the semiconductor substrate, the semiconductor pressure sensor basically comprising a semiconductor substrate having a first semiconductor region in which; at least a semiconductor device is formed, a second semiconductor region and an isolated layer buried between the first and second semiconductor regions, a cavity provided in the second semiconductor region, the opening thereof existing on the mail surface of the second semiconductor region and a strain detecting portion consisting of the semiconductor device and provided in the first semiconductor region opposite to the cavity. The semiconductor pressure sensor is featured in that at least one of the outer peripheral side surfaces of the first and the second semiconductor regions is formed inside of the outermost peripheral side surface of the isolation layer.
Public/Granted literature
- USD433126S Inhalation device Public/Granted day:2000-10-31
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