发明授权
- 专利标题: Apparatus for forming deposited film
- 专利标题(中): 用于形成沉积膜的装置
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申请号: US999548申请日: 1992-12-31
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公开(公告)号: US5322568A公开(公告)日: 1994-06-21
- 发明人: Shunichi Ishihara , Jun-ichi Hanna , Isamu Shimizu , Masaaki Hirooka
- 申请人: Shunichi Ishihara , Jun-ichi Hanna , Isamu Shimizu , Masaaki Hirooka
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX60-298041 19851228; JPX61-5951 19860115
- 主分类号: C23C16/452
- IPC分类号: C23C16/452 ; C23C16/00
摘要:
An apparatus for forming a deposited film by introducing two or more kinds of gaseous starting materials for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidation action for said starting materials into a reaction space to effect chemical contact therebetween to thereby form a plural number of precursors including precursors under excited state, and forming a deposited film in a plurality of layers with different compositions on a substrate existing in a film forming space spatially communicated with said reaction space with the use of at least one precursor of the precursors as the feeding source for the constituent element of the deposited film, said apparatus comprising a plural number of gas introducing means of a multiple tubular structure for discharging into said reaction space said gaseous starting materials and said gaseous halogenic oxidizing agent through the discharging outlets, respectively, and permitting them to react with each other to form the precursors and means for preventing contact of precursors unnecessary for the desired film formation of the precursors with the substrate.
公开/授权文献
- US5946366A Nuclear reactor with a collection chamber for core melt 公开/授权日:1999-08-31