发明授权
- 专利标题: Device for forming film by photo-chemical vapor deposition
- 专利标题(中): 光化学气相沉积法形成薄膜的装置
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申请号: US809915申请日: 1991-12-19
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公开(公告)号: US5328514A公开(公告)日: 1994-07-12
- 发明人: Naoki Inoue , Haruyuki Nakaoka , Hideki Azuma , Shigeru Morikawa , Takashi Kobayashi
- 申请人: Naoki Inoue , Haruyuki Nakaoka , Hideki Azuma , Shigeru Morikawa , Takashi Kobayashi
- 申请人地址: JPX
- 专利权人: Osaka Gas Company Limited
- 当前专利权人: Osaka Gas Company Limited
- 当前专利权人地址: JPX
- 优先权: JPX2-418142 19901221
- 主分类号: C23C16/48
- IPC分类号: C23C16/48 ; H01L21/205 ; H01L21/268 ; H01L21/31
摘要:
The invention provides a film-forming apparatus by a photo-CVD method comprising such essential structural elements as a light inlet in the form of a tube, a film-forming chamber, a light outlet in the form of a tube and a nozzle for feeding a mixture of a reactant and a gas for dilution so that a specific relation exists in the dimensions between the elements.With this structure, the film-forming apparatus by a photo-CVD method prevents the blur of the laser beam-incoming window due to contaminants adhered thereto, thereby enabling the extension of reaction time, increase of the deposition, and formation of a film with uniform thickness, and making the composition of the film closest to the stoichiometric one.
公开/授权文献
- US5852933A Hydraulic drives system for a press 公开/授权日:1998-12-29
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