Device for forming film by photo-chemical vapor deposition
    1.
    发明授权
    Device for forming film by photo-chemical vapor deposition 失效
    光化学气相沉积法形成薄膜的装置

    公开(公告)号:US5328514A

    公开(公告)日:1994-07-12

    申请号:US809915

    申请日:1991-12-19

    CPC分类号: C23C16/488 C23C16/483

    摘要: The invention provides a film-forming apparatus by a photo-CVD method comprising such essential structural elements as a light inlet in the form of a tube, a film-forming chamber, a light outlet in the form of a tube and a nozzle for feeding a mixture of a reactant and a gas for dilution so that a specific relation exists in the dimensions between the elements.With this structure, the film-forming apparatus by a photo-CVD method prevents the blur of the laser beam-incoming window due to contaminants adhered thereto, thereby enabling the extension of reaction time, increase of the deposition, and formation of a film with uniform thickness, and making the composition of the film closest to the stoichiometric one.

    摘要翻译: 本发明提供了一种通过光CVD法形成的成膜装置,其包括诸如管形式的光入口,成膜室,管形式的光出口和用于进料的喷嘴的基本结构元件 用于稀释的反应物和气体的混合物,使得元件之间的尺寸存在特定的关系。 利用这种结构,通过光CVD法的成膜装置防止了由于附着于其上的污染物引起的激光入射窗的模糊,从而能够延长反应时间,增加沉积和形成膜 均匀的厚度,并使膜的组成最接近化学计量。