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US5339346A Device fabrication entailing plasma-derived x-ray delineation 失效
器件制造需要等离子体衍生的x线描绘

Device fabrication entailing plasma-derived x-ray delineation
摘要:
Submicron device fabrication entailing ringfield x-ray pattern delineation is facilitated by use of a condenser including a faceted collector lens. The collector lens is constituted of paired facets, symmetrically placed about an axis of a laser-pumped plasma source. Each of the members of a pair produce an image of the entire illumination field so that inhomogeneities in illumination intensity are compensated within each composite image as produced by a particular pair.
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