发明授权
- 专利标题： Cast resin for optical use
- 专利标题（中）： 铸造树脂用于光学用途
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申请号： US967715申请日： 1992-10-28
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公开(公告)号： US5340893A公开(公告)日： 1994-08-23
- 发明人: Toshiaki Takaoka , Katsuyoshi Tanaka , Kenji Kato
- 申请人： Toshiaki Takaoka , Katsuyoshi Tanaka , Kenji Kato
- 申请人地址： JPX Tokyo JPX Tokyo
- 专利权人： NOF Corporation,Seiko Epson Corporation
- 当前专利权人： NOF Corporation,Seiko Epson Corporation
- 当前专利权人地址： JPX Tokyo JPX Tokyo
- 优先权： JPX3-288098 19911101
- 主分类号： B29C39/02
- IPC分类号： B29C39/02 ; B29K105/32 ; B29L11/00 ; C08F18/00 ; C08F18/14 ; C08F18/18 ; C08F120/04 ; C08F218/00 ; C08F218/16 ; C08F218/18 ; C08F290/00 ; C08F290/06 ; C08F299/02 ; G02B1/04 ; C08F18/24 ; C08F222/26
摘要：
A cast resin for optical use is obtained by polymerizing 40 to 89 wt % of a diallyl phthalate component represented by the formula (I) ##STR1## wherein --R.sub.1 is a hydrogen atom or a methyl group, --OR.sub.2 is a dihydric alcohol residue having 1 to 5 carbon atoms and m is an integer of from 0 to 20, 10 to 59 wt % of an alkylene glycol bis-allyl carbonate component represented by the formula (II) ##STR2## wherein --R.sub.4 is a hydrogen atom or a methyl group, --OR.sub.3 is a dihydric alcohol residue having 1 to 10 carbon atoms and n is an integer of from 0 to 10, and 1 to 30 wt % of a vinyl compound represented by the formula (III) ##STR3## wherein --R.sub.5 and --R.sub.6 stand for a hydrogen atom or a group ##STR4## wherein X and Y each indicate a hydrogen atom or a halogen atom other than a fluorine atom.