发明授权
- 专利标题： Method for manufacturing inorganic membranes by organometallic chemical vapor deposition
- 专利标题（中）： 通过有机金属化学气相沉积制造无机膜的方法
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申请号： US816195申请日： 1992-01-02
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公开(公告)号： US5360635A公开(公告)日： 1994-11-01
- 发明人: Robin E. Richards , Robert L. Iampietro , Paul N. Dyer
- 申请人： Robin E. Richards , Robert L. Iampietro , Paul N. Dyer
- 申请人地址： PA Allentown
- 专利权人： Air Products and Chemicals, Inc.
- 当前专利权人： Air Products and Chemicals, Inc.
- 当前专利权人地址： PA Allentown
- 主分类号： B01D71/02
- IPC分类号： B01D71/02 ; C01B13/14 ; C01G49/00 ; C04B41/52 ; C23C16/04 ; C23C16/40 ; C23C16/46 ; B05D5/00
摘要：
The present invention is a method for manufacturing inorganic membranes which are capable of separating oxygen from air. The membranes comprise a thin layer of a multicomponent metallic oxide which has been deposited onto a porous substrate by organometallic chemical vapor deposition. The inorganic membranes are formed by reacting organometallic complexes corresponding to each of the respective metals making up the multicomponent metallic oxide and an oxidizing agent under conditions sufficient to deposit a thin layer of the multicomponent metallic oxide onto the porous substrate.
公开/授权文献
- US5869893A Semiconductor device having a trapezoidal joint chip 公开/授权日：1999-02-09
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