发明授权
US5364433A Optical member of synthetic quartz glass for excimer lasers and method
for producing same
失效
用于准分子激光的合成石英玻璃的光学元件及其制造方法
- 专利标题: Optical member of synthetic quartz glass for excimer lasers and method for producing same
- 专利标题(中): 用于准分子激光的合成石英玻璃的光学元件及其制造方法
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申请号: US977397申请日: 1993-05-15
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公开(公告)号: US5364433A公开(公告)日: 1994-11-15
- 发明人: Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
- 申请人: Hiroyuki Nishimura , Akira Fujinoki , Toshikatsu Matsuya , Kyoichi Inaki , Toshiyuki Kato , Atsushi Shimada
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Quartz Products Company Limited
- 当前专利权人: Shin-Etsu Quartz Products Company Limited
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-182858 19910629; JPX3-299997 19910831
- 主分类号: C03B8/04
- IPC分类号: C03B8/04 ; C03B19/14 ; C03B37/014 ; C03C3/06 ; G03F7/20
摘要:
A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1.times.10.sup.16 molecules/cm.sup.3 or less, a homogeneity of refractive index of 5.times.10.sup.-6 or less in terms of .DELTA.n, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1.times.10.sup.-2 Torr or above to a temperature of 1,400 .degree. C. or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at last one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.
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