公开(公告)号：US08635886B2

公开(公告)日：2014-01-28

申请号：US13558698

申请日：2012-07-26

Applicant: Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

Inventor： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

IPC: C03B37/00 ,  C03B20/00

CPC classification number: C03B19/1438 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/40 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/085 ,  C03C4/12 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2203/44

Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

公开(公告)号：US07841211B2

公开(公告)日：2010-11-30

申请号：US10535935

申请日：2003-11-28

Applicant: Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

Inventor： Tatsuhiro Sato ,  Takahiro Kaitou ,  Akira Fujinoki ,  Toshiyuki Kato ,  Tohru Segawa ,  Nobumasa Yoshida

IPC: C03B20/00 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/24 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26

Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.

Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是制造吸收系数在245nm为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，然后进行烧成，由此形成致密的玻璃 身体。

公开(公告)号：USRE41249E1

公开(公告)日：2010-04-20

申请号：US11633136

申请日：2006-11-30

Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida ,  Akira Fujinoki ,  Kyoichi Inaki ,  Tomoyuki Shirai

Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida ,  Akira Fujinoki ,  Kyoichi Inaki ,  Tomoyuki Shirai

IPC: B32B15/00

CPC classification number: C30B31/14 ,  C03B19/01 ,  C03B19/066 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/06 ,  C03C2201/32 ,  C30B25/12 ,  C30B35/00 ,  Y10T428/24496 ,  Y10T428/26 ,  Y10T428/315

Abstract: An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.

Abstract translation: 本发明的目的是提供一种石英玻璃体，特别是用于制造具有优异的耐等离子体腐蚀性的半导体的等离子体反应用石英玻璃夹具，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。 提供由含有金属元素并具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 3小于100mm 2的投影面积表示的量的气泡和结晶相。

公开(公告)号：US20080216513A1

公开(公告)日：2008-09-11

申请号：US11919457

申请日：2006-04-27

Applicant: Tatsuhiro Sato ,  Akira Fujinoki ,  Itsuo Araki

Inventor： Tatsuhiro Sato ,  Akira Fujinoki ,  Itsuo Araki

IPC: C03B19/00 ,  C03C3/06

CPC classification number: C03B32/00 ,  C03B23/20 ,  C03C3/06 ,  C03C23/007 ,  C03C23/0075 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/54

Abstract: To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature.

Abstract translation: 为了提供通过完全去除已经用于半导体制造工艺中的石英玻璃夹具将附着在表面上的杂质和已经扩散到内部的杂质完全除去石英玻璃夹具和掺杂石英玻璃夹具的技术 然后进行工作维修和清除工作过程中的污染物。 使用后，在上述纯化处理工序中，从上述石英玻璃夹具中除去杂质，其中包括净化处理工艺，其中石英玻璃夹具在包含卤素元素的气氛中在温度范围内进行纯化处理 该区域高于规定温度。

公开(公告)号：US20060183622A1

公开(公告)日：2006-08-17

申请号：US10548237

申请日：2004-03-03

Applicant: Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC classification number: C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

Abstract: The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Abstract translation: 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US06887576B2

公开(公告)日：2005-05-03

申请号：US09935334

申请日：2001-08-22

Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida ,  Akira Fujinoki ,  Kyoichi Inaki ,  Tomoyuki Shirai

Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida ,  Akira Fujinoki ,  Kyoichi Inaki ,  Tomoyuki Shirai

IPC: C03B19/01 ,  C03B19/06 ,  C03B19/14 ,  C03B32/00 ,  C03C1/00 ,  C03C3/06 ,  C03C21/00 ,  C03C23/00 ,  C30B25/12 ,  C30B31/14 ,  B32B17/06 ,  B32B9/00

CPC classification number: C30B31/14 ,  C03B19/01 ,  C03B19/066 ,  C03B19/1453 ,  C03B20/00 ,  C03B32/00 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/06 ,  C03C2201/32 ,  C30B25/12 ,  C30B35/00 ,  Y10T428/24496 ,  Y10T428/26 ,  Y10T428/315

Abstract: An object of the present invention is to provide a quartz glass body, especially a quartz glass jig for plasma reaction in producing semiconductors having excellent resistance against plasma corrosion, particularly, excellent corrosion resistance against F-based gaseous plasma; and a method for producing the same. A body made of quartz glass containing a metallic element and having an improved resistance against plasma corrosion is provided that contains bubbles and crystalline phase at an amount expressed by projected area of less than 100 mm2 per 100 cm3.

Abstract translation: 本发明的目的是提供一种石英玻璃体，特别是用于制造具有优异的耐等离子体腐蚀性的半导体的等离子体反应用石英玻璃夹具，特别是对F系气态等离子体的优异的耐腐蚀性; 及其制造方法。 提供了由含有金属元素并且具有改善的等离子体腐蚀性的石英玻璃制成的体，其含有以每100cm 2小于100mm 2的投影面积表示的量的气泡和结晶相， SUP> 3 。

公开(公告)号：US06761951B2

公开(公告)日：2004-07-13

申请号：US10315990

申请日：2002-12-11

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Takayuki Shimakawa

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota ,  Akira Fujinoki ,  Hiroyuki Nishimura ,  Takayuki Shimakawa

IPC: B32B300

CPC classification number: C03C3/06 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57 ,  Y10T428/21 ,  Y10T428/2913

Abstract: A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1×10−6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.

Abstract translation: 通过沿着生长方向均匀化具有周期条纹的合成石英玻璃锭获得的具有特定尺寸的圆柱形，无氯合成石英玻璃坯料具有（a）在工作和离轴方向上的条纹等级，其满足美国A级 军事规格MIL-G-174B，（b）工作和离轴方向的平均羟基浓度分别为700〜1,000ppm，（c）工作和离轴方向的平均假想温度为850〜950℃ ，和（d）工作方向上最多为1×10 -6的633nm波长的光的折射率分布。 该空白对激光具有良好的透射率，当用激光照射时几乎不发生劣化，并且特别适用于ArF准分子激光相关应用。

公开(公告)号：US6031238A

公开(公告)日：2000-02-29

申请号：US29451

申请日：1998-02-26

Applicant: Akira Fujinoki ,  Hiroyuki Nishimura ,  Toshiki Mori

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Toshiki Mori

IPC: G02B13/14 ,  G03F7/20

CPC classification number: G03F7/701 ,  G02B13/14 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70958

Abstract: A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.

Abstract translation: PCT No.PCT / EP97 / 03406 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月30日PCT公布。 出版物WO98 / 00761 日本1998年1月8日在集成电路制造中，集成电路图案投影在晶片上的已知投影对准器包括ArF准分子激光器和由合成石英玻璃制成的石英玻璃光学部件组成的光学系统。 为了提供一种投影对准器，其具有在长时间不劣化的光学性能，例如耐久性，光透射率等，并且光学系统可以以低成本整体构造，因此建议光学 系统包括其氢分子浓度在1×10 17和5×10 18分子/ cm 3之间的第一石英玻璃光学构件组和氢分子浓度在5×1018至5×1019分/ cm 3之间的第三石英玻璃光学构件组。

公开(公告)号：US5970746A

公开(公告)日：1999-10-26

申请号：US28684

申请日：1998-02-24

Applicant: Akira Fujinoki ,  Akihiko Sugama ,  Masaatsu Kataoka ,  Wolfgang Englisch

Inventor： Akira Fujinoki ,  Akihiko Sugama ,  Masaatsu Kataoka ,  Wolfgang Englisch

IPC: G02B1/02 ,  C03B20/00 ,  C03B23/00 ,  C03B23/047 ,  C03B23/049 ,  C03B32/00 ,  G03F7/20 ,  C03B23/04

CPC classification number: G03F7/70241 ,  C03B23/0473 ,  C03B23/0493 ,  C03B32/00 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

Abstract: A method of preparing a ball-shaped synthetic silica glass optical article. The method includes a step of providing a rod-shaped synthetic silica glass having end faces at both sides thereof and having fewer cords per unit volume viewed in a direction perpendicular to a line connecting the end faces relative to the number of cords per unit volume viewed in a direction along the line connecting the end faces. The synthetic silica glass being optically homogeneous in the direction perpendicular to the line connecting the end faces. The method includes the further step of establishing support portions at the end faces of the synthetic silica glass. The rod-shaped synthetic silica glass is thereupon heated while being rotated around an axis connecting the support portions wherein a molten zone is formed. The molten zone of the rod-shaped synthetic silica glass is thereupon deformed by the application of pressure along the axis connecting the support portions whereupon a high purity ball-shaped optical article, having end faces and a side face positioned between the end faces, is formed. The optical article is characterized by a lesser number of cords per unit volume, viewed in a direction perpendicular to a line connecting the end faces relative to the number of cords per unit volume viewed in a direction along the line connecting the end faces. The rod-shaped synthetic silica glass is furthermore optically homogeneous in a direction perpendicular to the line connecting the end faces. The method is concluded by cutting the ball-shaped optical article at the edge support portions.

Abstract translation: 制备球形合成石英玻璃光学制品的方法。 该方法包括提供一种棒形合成石英玻璃的两端具有端面并且在垂直于连接端面的线的方向上相对于每单位体积的帘线数量来看，每单位体积具有较少的帘线 沿着连接端面的线的方向。 合成石英玻璃在垂直于连接端面的线的方向上是光学上均匀的。 该方法包括在合成石英玻璃的端面处建立支撑部分的另外的步骤。 随后将棒状合成石英玻璃围绕连接形成有熔融区的支撑部分的轴线旋转加热。 杆状合成石英玻璃的熔融区域随着连接支撑部分的轴线施加压力而变形，因此具有端面和位于端面之间的侧面的高纯度球形光学制品是 形成。 光学制品的特征在于，在沿着连接端面的线的方向上，从垂直于连接端面的线相对于每单位体积的帘线数量的线垂直的方向来看，每单位体积的帘线数量较少。 棒状合成石英玻璃在垂直于连接端面的线的方向上是光学上均匀的。 该方法通过在边缘支撑部分处切割球形光学制品而得出结论。

公开(公告)号：US20100251770A1

公开(公告)日：2010-10-07

申请号：US12802846

申请日：2010-06-15

Applicant: Hiroyuki Watanabe ,  Akira Fujinoki ,  Takayuki Imaizumi ,  Kazuhisa Hayakawa ,  Shingo Niinobe

Inventor： Hiroyuki Watanabe ,  Akira Fujinoki ,  Takayuki Imaizumi ,  Kazuhisa Hayakawa ,  Shingo Niinobe

IPC: C03B8/00

CPC classification number: C03B20/00 ,  C03B19/06 ,  C03B19/066

Abstract: A process for producing a transparent or opaque silica glass product including mixing a silica fine powder and a cellulose derivative and injection molding the mixture, followed by degreasing treatment and baking treatment, which is characterized in that the cellulose derivative is a cellulose derivative which causes reversible thermal gelation in an aqueous solution of at least one member selected from methyl cellulose, hydroxypropylmethyl cellulose and hydroxyethylmethyl cellulose; in producing a transparent silica glass product, the cellulose derivative is added in water heated at a gelation temperature thereof or higher, and after cooling, the formed aqueous solution is kneaded with the silica fine powder; and in producing an opaque silica glass product, the cellulose derivative is added in a silica slurry containing a silica powder and heated at a gelation temperature of the cellulose derivative or higher.