发明授权
US5371389A Heterojunction bipolar transistor with base layer having graded bandgap
失效
异质结双极晶体管,基极层具有梯度带隙
- 专利标题: Heterojunction bipolar transistor with base layer having graded bandgap
- 专利标题(中): 异质结双极晶体管,基极层具有梯度带隙
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申请号: US101685申请日: 1993-08-04
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公开(公告)号: US5371389A公开(公告)日: 1994-12-06
- 发明人: Toshinobu Matsuno , Atsushi Nakagawa , Takashi Hirose , Kaoru Inoue
- 申请人: Toshinobu Matsuno , Atsushi Nakagawa , Takashi Hirose , Kaoru Inoue
- 申请人地址: JPX Kadoma
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Kadoma
- 优先权: JPX4-217641 19920817
- 主分类号: H01L29/205
- IPC分类号: H01L29/205 ; H01L21/331 ; H01L29/10 ; H01L29/73 ; H01L29/737 ; H01L29/161 ; H01L29/225
摘要:
A base layer interposed between an n-type GaAs collector layer and an n-type AlGaAs emitter layer is composed of a p-type InAlGaAs. From a collector/base interface to an emitter/base interface, an InAs composition of the base layer is decreased and a concentration of carbon as a p-type impurity thereof is increased so as to obtain a built-in internal field intensity in the base layer by a cooperative effect of the graded-bandgap and the impurity concentration gradient, thus reducing a base transit time of electrons. The base layer is fabricated according to MOMBE using TMG as a gallium source, controlling the InAs composition, so that a desired carbon concentration gradient is automatically formed. Thereby, a high performance heterojunction bipolar transistor with an increased built-in internal field intensity in the base layer is obtained.
公开/授权文献
- USD429490S Radiotelephone face 公开/授权日:2000-08-15
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