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US5381101A System and method of measuring high-speed electrical waveforms using force microscopy and offset sampling frequencies 失效
使用力显微镜和偏移采样频率测量高速电波形的系统和方法

System and method of measuring high-speed electrical waveforms using
force microscopy and offset sampling frequencies
摘要:
A potentiometry apparatus for measuring a periodic electrical waveform existing proximate the surface of a sample such as a semiconductor wafer is disclosed herein. The potentiometry apparatus includes a pulse generator for generating a sequence of electrical pulses at a pulse frequency offset from the frequency of the surface waveform by a mixing frequency. A cantilever coupled to the pulse generator serves to carry the electrical pulses to a position proximate the surface of the sample. In a capacitive displacement mode the cantilever is mechanically displaced so as to generate a time-expanded representation of the electrical surface waveform having a repetition frequency equal to the mixing frequency. During displacement mode operation an optical detection circuit may be employed to monitor deflection of the cantilever. In a tunneling current mode the cantilever is again employed to carry the electrical pulses to a position proximate the surface of the sample. In this mode a tunneling current propagating through the cantilever at the mixing frequency provides a time-expanded representation of the electrical surface waveform.
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