发明授权
US5387486A Radiation-polymerizable mixture and process for producing a solder
resist mask
失效
可辐射聚合的混合物和制造阻焊掩模的方法
- 专利标题: Radiation-polymerizable mixture and process for producing a solder resist mask
- 专利标题(中): 可辐射聚合的混合物和制造阻焊掩模的方法
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申请号: US144115申请日: 1993-10-27
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公开(公告)号: US5387486A公开(公告)日: 1995-02-07
- 发明人: Michael Emmelius , Walter Herwig , Kurt Erbes , Rudolf Decker
- 申请人: Michael Emmelius , Walter Herwig , Kurt Erbes , Rudolf Decker
- 申请人地址: IL Chicago
- 专利权人: Morton International, Inc.
- 当前专利权人: Morton International, Inc.
- 当前专利权人地址: IL Chicago
- 优先权: DEX3931467 19890921
- 主分类号: G03F7/033
- IPC分类号: G03F7/033 ; C08F257/02 ; C08F283/10 ; C08G59/00 ; C08G59/18 ; C08G59/40 ; C08K3/36 ; G03F1/08 ; G03F7/004 ; G03F7/031 ; G03F7/032 ; G03F7/038 ; H05K3/06 ; H05K3/28 ; G03C3/00
摘要:
The present invention relates to a radiation-polymerizable mixture which includes a polymerizable compound, a polymeric binder which has units of methacrylic acid, a methacrylic acid ester and a styrene, the latter in a proportion of 40 to 65% by weight, a finely divided mineral pigment on a silicic acid or silicate basis, a photopolymerization initiator, a compound having at least two epoxy groups in its molecule and a thermal hardener for epoxy groups. The mixture is advantageous, in particular, for producing solder masks and can be cured after exposure to an image and development by heating to about 80.degree. to 150.degree. C. to form a stencil which is resistant under soldering conditions.
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