发明授权
- 专利标题: Method of producing a thin film multilayer wiring board
- 专利标题(中): 薄膜多层布线板的制造方法
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申请号: US845942申请日: 1992-03-04
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公开(公告)号: US5393406A公开(公告)日: 1995-02-28
- 发明人: Hitoshi Yokono , Hideo Arima , Takashi Inoue , Naoya Kitamura
- 申请人: Hitoshi Yokono , Hideo Arima , Takashi Inoue , Naoya Kitamura
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX3-039833 19910306
- 主分类号: H05K3/10
- IPC分类号: H05K3/10 ; H01L21/48 ; H05K3/20 ; H05K3/42 ; H05K3/46 ; C25D5/02
摘要:
A thin film multilayer wiring board-producing method of the present invention is intended to decrease thermal stresses developing during the formation of the multilayer construction, and also to greatly reduce the number of the steps of the process, as compared with a conventional method. A film material can be used as an insulating film of the multilayer wiring board, and is adhesively bonded to a predetermined portion. Wiring conductors are formed by electroplating. The wiring layers are repeated laminated to form the multilayer construction. A metallic film serving as an electrode is formed on one of upper and lower surfaces of a substrate, the metallic film being removed after a multilayer wiring is formed. A soluble insulating film is formed on a metallic undercoat film on the substrate, and grooves are formed in the soluble insulating film, and wiring conductors are formed in the grooves, using either electroplating or both electroplating and electroless plating. Thereafter, the soluble insulating film and the metallic undercoat film are removed. Subsequently, an insoluble insulating film is formed at those locations from which the soluble insulating film and the metallic undercoat have been removed.
公开/授权文献
- US5835506A Single pass doublet mode integrated circuit tester 公开/授权日:1998-11-10
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