发明授权
US5419995A Photoresist composition with alternating or block copolymer resins and
positive-working o-quinone diazide or negative-working azide sensitizer
compound
失效
具有交替或嵌段共聚物树脂和正性工作的邻醌二叠氮化物或负性叠氮化物增感剂化合物的光致抗蚀剂组合物
- 专利标题： Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound
- 专利标题（中）： 具有交替或嵌段共聚物树脂和正性工作的邻醌二叠氮化物或负性叠氮化物增感剂化合物的光致抗蚀剂组合物
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申请号： US061369申请日： 1993-05-13
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公开(公告)号： US5419995A公开(公告)日： 1995-05-30
- 发明人: Anthony Zampini
- 申请人： Anthony Zampini
- 申请人地址： MA Marlborough
- 专利权人： Shipley Company Inc.
- 当前专利权人： Shipley Company Inc.
- 当前专利权人地址： MA Marlborough
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/022 ; G03F7/012 ; G03F7/023
摘要：
A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolymer with a second reactive phenol in the presence of an aldehyde to form substantially block copolymers. The use of these resins in photoresist formulations leads to improved thermal properties, etch resistance and photospeed.
公开/授权文献
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