发明授权
US5432314A Transparent mask plate for charged particle beam exposure apparatus and
charged particle beam exposure process using the transparent mask plate
失效
用于带电粒子束曝光装置的透明掩模板和使用透明掩模板的带电粒子束曝光工艺
- 专利标题： Transparent mask plate for charged particle beam exposure apparatus and charged particle beam exposure process using the transparent mask plate
- 专利标题（中）： 用于带电粒子束曝光装置的透明掩模板和使用透明掩模板的带电粒子束曝光工艺
-
申请号： US109263申请日： 1993-08-20
-
公开(公告)号： US5432314A公开(公告)日： 1995-07-11
- 发明人: Satoru Yamazaki , Yoshihisa Oae , Kiichi Sakamoto , Akio Yamada
- 申请人： Satoru Yamazaki , Yoshihisa Oae , Kiichi Sakamoto , Akio Yamada
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX4-221524 19920820
- 主分类号： G03F1/20
- IPC分类号： G03F1/20 ; G03F1/68 ; G03F7/20 ; G03F9/00 ; H01J37/317 ; H01L21/027 ; H01J37/04
摘要：
A transparent mask plate used in a charged particle beam exposure apparatus includes a base plate, an exposure pattern area, and a calibration area. The exposure pattern area is formed in the base plate and has a plurality of transparent patterns for shaping a cross section of a charged particle beam into a block pattern. The calibration area is formed in the base plate, and has a plurality of transparent patterns used for obtaining a condition for deflecting the charged particle beam. The plurality of transparent patterns formed in the calibration area are arranged at the same pitch as the plurality of transparent patterns formed in the exposure pattern area. Each of the plurality of transparent patterns formed in the calibration area corresponds to one of the plurality of transparent patterns formed in the exposure pattern area.
公开/授权文献
- US4849516A Oxadiazines 公开/授权日：1989-07-18