摘要:
A roller shade includes a light shielding sheet which can be rolled up in a roll shape, a roller and an electric motor for openably moving the light shielding sheet, guide belts connected to respective lower surfaces of side end parts of the light shielding sheet in a sheet width direction, and a pair of guide parts each having a guide space which receives a corresponding one of the side end parts of the light shielding sheet in the sheet width direction and a corresponding one of the guide belts, for guiding the side end part and the guide belt. In the roller shade, the light shielding sheet is prevented from being creased when the light shielding sheet moves in the width direction while being rolled or unrolled, due to lack of a tension of the light shielding sheet in the width direction.
摘要:
In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.
摘要:
A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.
摘要:
An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.
摘要:
A viewing surveillance system which make it possible to carry out the viewing surveillance independently from the broadcasting form like analog broadcasting or digital broadcasting. The viewing surveillance system also make it possible to carry out the viewing surveillance without any restriction set to viewers or any burden to the broadcast stations. The image feature data generating unit 12 receives a picture signal from the image viewing terminal 50, and generates the image feature data which represents a feature of the image from the picture signal. The image information transmitting unit 13 transmits the image feature data generated by the image feature data generating unit 12 to the viewing surveillance server 2. On the other hand, the image feature data generating units 21a to 21c also generates the image feature data based on the broadcasted programs and stores the image feature data in the program image feature data storing unit 22. The viewing program specifying unit 23 specifies the viewed program by matching the image feature data received from the image information transmitting unit 13 and the image feature data stored in the program image feature data storing unit 22.
摘要:
An electron beam exposure system is designed to correct a proximity effect. The electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions that are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.
摘要:
A method for controlling measurement in a motor-driven in-line screw type injection molding machine using servo-motors as a measurement driving source and an injection driving source. Control is made so that all of a measured value of back pressure controlled by the measurement servo-motor, a measured value of an astern speed of a screw controlled by the injection servo-motor, and a measured rotational speed of the screw turn zero concurrently at timing when the screw reaches a measurement completion position. Thus, suck-back can be made dispensable.
摘要:
The picture retrieving apparatus includes: an orthogonal conversion coefficient memory 13 of a retrieval target picture storing an orthogonal conversion coefficient of a picture targeted for a retrieval; a picture feature amount converter 2 converting an orthogonal conversion coefficient 21 read from the orthogonal conversion coefficient memory 13 of the retrieval target picture into a color histogram information; and a color histogram similarity calculator 4 calculating a similarity 42 between a color histogram information 41 of a query picture and a color histogram information 25 generated by the picture feature amount converter 2. It unifies the kinds of the picture feature amounts to calculate the similarity between the picture feature amounts. Thus, it can specify the picture similar to the query picture from the retrieval target picture, on the basis of the calculated similarity.
摘要:
A connector includes a housing and a required number of pusher members. The housing has a fitting aperture into which two or at least three flexible printed circuit boards are inserted and insertion openings for holding the required number of the pusher members. When the two or at least three flexible printed circuit boards are inserted into the fitting aperture of the housing, contact portions of the two or at least three flexible printed circuit boards are urged by the pusher members so as to be connected to each other to achieve electrical continuity of the connector. With this construction, the connector can be mounted on anywhere with the exception of a flexible printed circuit board as by adhesion or pushing down by a frame of the set without using soldering, thereby permitting low cost manufacture and wide freedom of selection of connector mechanisms.