ROLLER SHADE
    1.
    发明申请
    ROLLER SHADE 有权
    滚子阴影

    公开(公告)号:US20140224436A1

    公开(公告)日:2014-08-14

    申请号:US14127397

    申请日:2013-03-27

    IPC分类号: B60J7/06 E06B9/42

    CPC分类号: B60J7/06 B60J7/0015 E06B9/42

    摘要: A roller shade includes a light shielding sheet which can be rolled up in a roll shape, a roller and an electric motor for openably moving the light shielding sheet, guide belts connected to respective lower surfaces of side end parts of the light shielding sheet in a sheet width direction, and a pair of guide parts each having a guide space which receives a corresponding one of the side end parts of the light shielding sheet in the sheet width direction and a corresponding one of the guide belts, for guiding the side end part and the guide belt. In the roller shade, the light shielding sheet is prevented from being creased when the light shielding sheet moves in the width direction while being rolled or unrolled, due to lack of a tension of the light shielding sheet in the width direction.

    摘要翻译: 卷帘包括可卷绕成卷状的遮光片,滚子和电动马达,用于使遮光片可开启地移动,导光带连接到遮光片的侧端部的各个下表面 以及一对引导部,每个引导部具有引导空间,该引导空间容纳遮光片的片宽度方向上的相应的一个侧端部和相应的一个引导带,用于引导侧端部 和导带。 在卷帘中,由于遮光片在宽度方向上的张力不足,防光片在卷绕或展开的同时沿宽度方向移动时,防止了遮光片的折痕。

    ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD
    2.
    发明申请
    ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD 有权
    电子束曝光装置和电子束曝光方法

    公开(公告)号:US20120256106A1

    公开(公告)日:2012-10-11

    申请号:US13439595

    申请日:2012-04-04

    IPC分类号: G21K5/04

    摘要: In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.

    摘要翻译: 在多列电子束曝光装置中,通过在晶片上排列多个列单元来并行进行曝光处理,得到各列单元的曝光强度与行宽的关系(步骤S41,步骤S44)。 然后,获得校正参数,其允许校正目标列单元的曝光强度和线宽之间的关系与从多个列单元格中选择的参考列单元的曝光强度和线宽之间的关系一致( 步骤S43和S46)。 此后,通过基于由此获得的校正参数来校正参考柱单元的曝光时间来获得每个列单元的曝光时间。

    Multi-column electron beam exposure apparatus and multi-column electron beam exposure method
    3.
    发明授权
    Multi-column electron beam exposure apparatus and multi-column electron beam exposure method 有权
    多列电子束曝光装置和多列电子束曝光方法

    公开(公告)号:US08222619B2

    公开(公告)日:2012-07-17

    申请号:US12586717

    申请日:2009-09-25

    IPC分类号: A61N5/00 G21G5/00

    摘要: A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.

    摘要翻译: 多列电子束曝光装置包括:多个柱单元; 包括用于测量电子束特性的电子束特性检测单元的晶片台; 以及用于通过使用电子束特性检测单元来测量在所有列单元中使用的电子束的光束特性的控制器,并且用于调节各列电池的电子束,使得在列中使用的电子束的性质 细胞可以大致相同。 电子束特性可以是要发射的电子束的光束位置,光束强度和光束形状中的任何一个。 电子束特性检测单元可以是用于在其上形成有参考标记的校准芯片或法拉第杯。

    Electron beam lithography apparatus and electron beam lithography method
    4.
    发明申请
    Electron beam lithography apparatus and electron beam lithography method 有权
    电子束光刻设备和电子束光刻法

    公开(公告)号:US20110226967A1

    公开(公告)日:2011-09-22

    申请号:US13068995

    申请日:2011-05-25

    IPC分类号: G21K5/00

    摘要: An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.

    摘要翻译: 一种电子束光刻设备,包括:存储器,用于根据设备图案所要求的准确度,对分配了等级的绘图图形进行数据存储;绘图模式调整单元,基于该等级生成分割图形的数据;结算等待时间调整 基于等级确定结算等待时间的单元,以及基于划分的绘图图案和结算等待时间的数据来照射电子束时绘制设备图案的控制器。 绘制图案调整单元基于等级来确定分割绘制图案的长边长度的上限或划分的绘制图案的区域的上限,并且基于上限划分绘图图案。

    Viewing surveillance system for carrying out surveillance independent of a broadcasting form
    5.
    发明授权
    Viewing surveillance system for carrying out surveillance independent of a broadcasting form 有权
    观看独立于广播形式进行监视的监视系统

    公开(公告)号:US07920164B2

    公开(公告)日:2011-04-05

    申请号:US10558687

    申请日:2004-06-24

    摘要: A viewing surveillance system which make it possible to carry out the viewing surveillance independently from the broadcasting form like analog broadcasting or digital broadcasting. The viewing surveillance system also make it possible to carry out the viewing surveillance without any restriction set to viewers or any burden to the broadcast stations. The image feature data generating unit 12 receives a picture signal from the image viewing terminal 50, and generates the image feature data which represents a feature of the image from the picture signal. The image information transmitting unit 13 transmits the image feature data generated by the image feature data generating unit 12 to the viewing surveillance server 2. On the other hand, the image feature data generating units 21a to 21c also generates the image feature data based on the broadcasted programs and stores the image feature data in the program image feature data storing unit 22. The viewing program specifying unit 23 specifies the viewed program by matching the image feature data received from the image information transmitting unit 13 and the image feature data stored in the program image feature data storing unit 22.

    摘要翻译: 一种观看监视系统,其可以独立于诸如模拟广播或数字广播的广播形式进行观看监视。 观看监视系统还可以进行观看监视,而不会对观众造成任何限制或对广播电台造成任何负担。 图像特征数据生成单元12从图像观看终端50接收图像信号,并从图像信号生成表示图像的特征的图像特征数据。 图像信息发送单元13将由图像特征数据生成单元12生成的图像特征数据发送到观看监视服务器2.另一方面,图像特征数据生成单元21a至21c还基于图像特征数据生成单元 广播节目并将图像特征数据存储在节目图像特征数据存储单元22中。观看节目指定单元23通过将从图像信息发送单元13接收的图像特征数据和存储在图像特征数据中的图像特征数据进行匹配来指定所观看的节目 节目图像特征数据存储单元22。

    Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
    6.
    发明授权
    Electron beam exposure mask, electron beam exposure method, and electron beam exposure system 有权
    电子束曝光掩模,电子束曝光法和电子束曝光系统

    公开(公告)号:US07847272B2

    公开(公告)日:2010-12-07

    申请号:US11235422

    申请日:2005-09-26

    IPC分类号: A61N5/00

    摘要: An electron beam exposure system is designed to correct a proximity effect. The electron beam exposure system includes: an electron beam generation unit for generating an electron beam; an electron beam exposure mask having opening portions that are arranged so that sizes of the opening portions change at a predetermined rate in order of arrangement; a mask deflection unit for deflecting the electron beam on the electron beam exposure mask; a substrate deflection unit for deflecting and projecting the electron beam onto a substrate; and a control unit for controlling deflection amounts in the mask deflection unit and the substrate deflection unit. The direction or directions of the change may be any one of a row direction and a column direction or may be the row and column directions.

    摘要翻译: 电子束曝光系统设计用于校正邻近效应。 电子束曝光系统包括:用于产生电子束的电子束产生单元; 电子束曝光掩模,其具有开口部,其设置成使得开口部的尺寸按照布置的顺序以预定的速率变化; 用于使电子束在电子束曝光掩模上偏转的掩模偏转单元; 用于将电子束偏转和投影到衬底上的衬底偏转单元; 以及用于控制掩模偏转单元和基板偏转单元中的偏转量的控制单元。 改变的方向或方向可以是行方向和列方向中的任何一个,或者可以是行和列方向。

    Injection molding machine for controlling measurement of an in-line screw
    7.
    发明授权
    Injection molding machine for controlling measurement of an in-line screw 有权
    用于控制直列螺杆测量的注塑机

    公开(公告)号:US07677875B2

    公开(公告)日:2010-03-16

    申请号:US12208209

    申请日:2008-09-10

    申请人: Akio Yamada

    发明人: Akio Yamada

    IPC分类号: B29C45/77

    摘要: A method for controlling measurement in a motor-driven in-line screw type injection molding machine using servo-motors as a measurement driving source and an injection driving source. Control is made so that all of a measured value of back pressure controlled by the measurement servo-motor, a measured value of an astern speed of a screw controlled by the injection servo-motor, and a measured rotational speed of the screw turn zero concurrently at timing when the screw reaches a measurement completion position. Thus, suck-back can be made dispensable.

    摘要翻译: 一种使用伺服电动机作为测量驱动源和注入驱动源的电动直列螺杆式注塑机中的测量方法。 进行控制,使得由测量伺服电动机控制的背压的测量值,由喷射伺服电动机控制的螺杆的后退速度的测量值和螺杆的测量转速同时变为零 在螺钉到达测量完成位置的时刻。 因此,回吸可以是不必要的。

    Picture retrieving apparatus and method which converts orthogonal transform coefficients into color histogram data
    8.
    发明授权
    Picture retrieving apparatus and method which converts orthogonal transform coefficients into color histogram data 失效
    将正交变换系数转换为彩色直方图数据的图像检索装置和方法

    公开(公告)号:US07457460B2

    公开(公告)日:2008-11-25

    申请号:US11802457

    申请日:2007-05-23

    IPC分类号: G06K9/00 G06K9/36

    摘要: The picture retrieving apparatus includes: an orthogonal conversion coefficient memory 13 of a retrieval target picture storing an orthogonal conversion coefficient of a picture targeted for a retrieval; a picture feature amount converter 2 converting an orthogonal conversion coefficient 21 read from the orthogonal conversion coefficient memory 13 of the retrieval target picture into a color histogram information; and a color histogram similarity calculator 4 calculating a similarity 42 between a color histogram information 41 of a query picture and a color histogram information 25 generated by the picture feature amount converter 2. It unifies the kinds of the picture feature amounts to calculate the similarity between the picture feature amounts. Thus, it can specify the picture similar to the query picture from the retrieval target picture, on the basis of the calculated similarity.

    摘要翻译: 图像检索装置包括:检索对象图像的正交变换系数存储器13,存储用于检索的图像的正交变换系数; 图像特征量转换器2将从检索对象图像的正交变换系数存储器13读取的正交变换系数21变换为颜色直方图信息; 以及颜色直方图相似度计算器4,计算查询图像的颜色直方图信息41和由图像特征量转换器2生成的颜色直方图信息25之间的相似度42.它统一图像特征量的种类以计算图像特征量之间的相似度 图片功能量。 因此,可以基于计算出的相似度,从检索对象图像中指定与查询图像相似的图像。

    Connector
    9.
    发明授权
    Connector 有权
    连接器

    公开(公告)号:US07241167B2

    公开(公告)日:2007-07-10

    申请号:US10726204

    申请日:2003-12-02

    IPC分类号: H01R12/24

    CPC分类号: H01R12/62 H01R12/7064

    摘要: A connector includes a housing and a required number of pusher members. The housing has a fitting aperture into which two or at least three flexible printed circuit boards are inserted and insertion openings for holding the required number of the pusher members. When the two or at least three flexible printed circuit boards are inserted into the fitting aperture of the housing, contact portions of the two or at least three flexible printed circuit boards are urged by the pusher members so as to be connected to each other to achieve electrical continuity of the connector. With this construction, the connector can be mounted on anywhere with the exception of a flexible printed circuit board as by adhesion or pushing down by a frame of the set without using soldering, thereby permitting low cost manufacture and wide freedom of selection of connector mechanisms.

    摘要翻译: 连接器包括壳体和所需数量的推动器构件。 壳体具有一个配合孔,两个或至少三个柔性印刷电路板插入其中,并具有用于保持所需数量的推动构件的插入口。 当两个或至少三个柔性印刷电路板插入壳体的配合孔中时,两个或至少三个柔性印刷电路板的接触部分被推动器构件推动以便彼此连接以实现 连接器的电气连续性。 通过这种结构,除了柔性印刷电路板之外,连接器可以安装在任何地方,如通过粘合或通过组件的框架而不使用焊接来下压,从而允许低成本制造和连接器机构的选择的宽自由度。