发明授权
- 专利标题: Chemically adsorbed ultrathin film and its material, and method of manufacturing the same
- 专利标题(中): 化学吸附超薄膜及其材料及其制造方法
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申请号: US384594申请日: 1995-02-03
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公开(公告)号: US5461166A公开(公告)日: 1995-10-24
- 发明人: Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Kazuyuki Asakura
- 申请人: Norihisa Mino , Kazufumi Ogawa , Toshinobu Ishihara , Mikio Endo , Tohru Kubota , Kazuyuki Asakura
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX4-242352 19920910
- 主分类号: C07B61/00
- IPC分类号: C07B61/00 ; B01J23/42 ; B05D1/18 ; C07F7/08 ; C07F7/12 ; C07F7/18 ; C09K3/00 ; G03F7/075 ; C07D333/02 ; C08G77/08 ; C08F28/06
摘要:
Disclosed are a conductive thienyl derivative monomolecular film covalently bonded to a substrate surface and method of manufacturing the same, and a silicon compound comprising 3-thienyl groups (thiophene derivative) used for forming the conductive monomolecular film and a method of manufacturing the same. A monomolecular ultrathin film comprising 3-thienyl groups and silicon groups is formed in the invention. The silicon compound used for forming the film is provided by reacting .omega.-(3-thienyl)-1-alkene compound to a monosilane derivative compound, in which three out of four hydrogen atoms of monosilane are replaced with halogen or alkoxy groups, in the presence of a transition metal catalyst. A substrate is dipped and held in a nonaqueous solution of the above-noted compound, thus chemically bonding the monomolecular film to the substrate surface. Furthermore, a thienyl derivative ultrathin film is formed by the electrolytic or catalytic polymerization of the monomolecular film.
公开/授权文献
- US4526669A Cathodic component for aluminum reduction cell 公开/授权日:1985-07-02
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