发明授权
US5470452A Shielding for arc suppression in rotating magnetron sputtering systems
失效
用于旋转磁控溅射系统中的电弧抑制的屏蔽
- 专利标题: Shielding for arc suppression in rotating magnetron sputtering systems
- 专利标题(中): 用于旋转磁控溅射系统中的电弧抑制的屏蔽
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申请号: US158729申请日: 1993-11-29
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公开(公告)号: US5470452A公开(公告)日: 1995-11-28
- 发明人: Eric R. Dickey , Erik J. Bjornard
- 申请人: Eric R. Dickey , Erik J. Bjornard
- 申请人地址: MN Faribault
- 专利权人: Viratec Thin Films, Inc.
- 当前专利权人: Viratec Thin Films, Inc.
- 当前专利权人地址: MN Faribault
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; C23C14/35 ; H01J37/34
摘要:
A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.
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