发明授权
- 专利标题： Apparatus for projecting a mask pattern on a substrate
- 专利标题（中）： 用于将掩模图案投影在基板上的装置
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申请号： US57437申请日： 1993-05-06
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公开(公告)号： US5481362A公开(公告)日： 1996-01-02
- 发明人: Marinus A. Van Den Brink , Henk F. D. Linders , Stefan Wittekoek
- 申请人： Marinus A. Van Den Brink , Henk F. D. Linders , Stefan Wittekoek
- 申请人地址： NLX Veldhoven
- 专利权人： ASM Lithography
- 当前专利权人： ASM Lithography
- 当前专利权人地址： NLX Veldhoven
- 优先权： NLX9001611 19900716
- 主分类号： G03F1/08
- IPC分类号： G03F1/08 ; G03F7/20 ; G03F9/00 ; H01L21/027 ; H01L21/30 ; G01B11/00
摘要：
An apparatus for projecting a mask pattern (MA) on a substrate (W) by means of a projection lens system (PL) is described, which apparatus comprises a device for aligning a mask alignment mark (M.sub.1, M.sub.2) with respect to a substrate alignment mark (P.sub.1, P.sub.2). Means (WE.sub.1, WE.sub.2) preventing phase differences due to reflections at the mask plate (MA) from occurring within the alignment beam portions received by a detection system (13, 13') are arranged in the path of selected alignment beam portions (b.sub.1, b.sub.1 ').
公开/授权文献
- USD387042S Computer mouse 公开/授权日：1997-12-02
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