公开(公告)号：US5481362A

公开(公告)日：1996-01-02

申请号：US57437

申请日：1993-05-06

申请人： Marinus A. Van Den Brink ,  Henk F. D. Linders ,  Stefan Wittekoek

发明人： Marinus A. Van Den Brink ,  Henk F. D. Linders ,  Stefan Wittekoek

IPC分类号： G03F1/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7049

摘要： An apparatus for projecting a mask pattern (MA) on a substrate (W) by means of a projection lens system (PL) is described, which apparatus comprises a device for aligning a mask alignment mark (M.sub.1, M.sub.2) with respect to a substrate alignment mark (P.sub.1, P.sub.2). Means (WE.sub.1, WE.sub.2) preventing phase differences due to reflections at the mask plate (MA) from occurring within the alignment beam portions received by a detection system (13, 13') are arranged in the path of selected alignment beam portions (b.sub.1, b.sub.1 ').

摘要翻译： 描述了一种用于通过投影透镜系统（PL）将掩模图案（MA）投影在基板（W）上的装置，该装置包括用于将掩模对准标记（M1，M2）相对于基板 对准标记（P1，P2）。 在检测系统（13,13'）所接收的对准光束部分内发生防止在掩模板（MA）上产生反射的相位差的装置（WE1，WE2）布置在选定的对准光束部分（b1， b1'）。

公开(公告)号：US5191200A

公开(公告)日：1993-03-02

申请号：US808340

申请日：1991-12-16

申请人： Jan E. van der Werf ,  Marinus A. van den Brink ,  Henk F. D. Linders ,  Johannes M. M. Beltman

发明人： Jan E. van der Werf ,  Marinus A. van den Brink ,  Henk F. D. Linders ,  Johannes M. M. Beltman

IPC分类号： G02B7/28 ,  G02B21/24 ,  G03F7/207 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7026 ,  G02B21/241 ,  G03F9/7034 ,  G03F9/7049

摘要： An imaging apparatus has an imaging system (PL) and a focus detection device for determining a deviation between the image plane of the imaging system and a second plane (WS) on which imaging is to take place. The focus error detection system includes a radiation source (S) which supplies a beam (b.sub.f) having a wide wavelength band, an object grating (G.sub.1) and an image grating (G.sub.2) which are imaged onto each other via the second plane. In the focus detection system a reference beam (b.sub.r) which is reflected by the outer surface (RP) of the imaging system can be used in combination or not in combination with the wideband beam and the gratings. By using a number of such focus detection systems a tilt detection device can be realized for detecting the position of the second plane (WS) with respect to the image plane.