发明授权
US5539211A Charged beam apparatus having cleaning function and method of cleaning
charged beam apparatus
失效
具有清洁功能的带电束装置和清洗带电束装置的方法
- 专利标题: Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus
- 专利标题(中): 具有清洁功能的带电束装置和清洗带电束装置的方法
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申请号: US365825申请日: 1994-12-29
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公开(公告)号: US5539211A公开(公告)日: 1996-07-23
- 发明人: Kenji Ohtoshi , Itsuko Sakai , Yuichiro Yamazaki , Jun Takamatsu , Munehiro Ogasawara , Kazuyoshi Sugihara
- 申请人: Kenji Ohtoshi , Itsuko Sakai , Yuichiro Yamazaki , Jun Takamatsu , Munehiro Ogasawara , Kazuyoshi Sugihara
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX5-350968 19931229; JPX6-154805 19940706; JPX6-248477 19940917; JPX6-313715 19941216
- 主分类号: H01J37/18
- IPC分类号: H01J37/18 ; B08B7/00 ; H01J37/30 ; H01L21/027
摘要:
A charged beam apparatus comprises a source tank provided outside the column and containing a plasma source, a plasma generating apparatus for generating plasma from a plasma source supplied from the source tank, gate valves and an exhausting pump for introducing plasma generated by the plasma generating apparatus into the column and for exhausting the plasma therefrom, and an O-ring for restricting a passage of plasma in the column such that those portions of cleaning portions to be cleaned to which internal contaminants stick are mainly exposed to plasma. Therefore, it is possible to generation of an oxide film, a fluoride film, or the likes which cause drifting can be restricted.
公开/授权文献
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