Invention Grant
US5544213A Mask holding method, mask and mask chuck, exposure apparatus using the
mask and the mask chuck, and device production method using the
exposure apparatus
失效
掩模保持方法，掩模和掩模卡盘，使用掩模和掩模卡盘的曝光装置，以及使用曝光装置的装置制造方法
- Patent Title: Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
- Patent Title (中): 掩模保持方法，掩模和掩模卡盘，使用掩模和掩模卡盘的曝光装置，以及使用曝光装置的装置制造方法
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Application No.: US343961Application Date: 1994-11-17
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Publication No.: US5544213APublication Date: 1996-08-06
- Inventor: Yuji Chiba , Shinichi Hara
- Applicant: Yuji Chiba , Shinichi Hara
- Applicant Address: JPX Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JPX Tokyo
- Priority: JPX5-299912 19931130
- Main IPC: G03F1/66
- IPC: G03F1/66 ; G03F7/20 ; G21K1/06 ; H01L21/027 ; G21K5/00
Abstract:
V-shaped linear groove portions are formed at regular intervals and at three positions (with 120.degree. pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.
Public/Granted literature
- US6111435A Low power multiplexer with shared, clocked transistor Public/Granted day:2000-08-29
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