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34 条记录 (耗时 0.017 秒)

    Mask and mask supporting mechanism
    1.
    发明授权
    Mask and mask supporting mechanism 失效
    面罩和面罩支撑机构

    公开(公告)号：US5825463A

    公开(公告)日：1998-10-20

    申请号：US791545

    申请日：1997-01-31

    申请人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

    发明人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

    IPC分类号： G03F1/22 ,  G03F7/20 ,  G03B27/62

    CPC分类号： G03F1/22 ,  G03F7/707

    摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.

    摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。

    Substrate holding device and exposing apparatus using the same
    4.
    发明授权
    Substrate holding device and exposing apparatus using the same 失效
    基板保持装置和使用其的曝光装置

    公开(公告)号：US5883932A

    公开(公告)日：1999-03-16

    申请号：US464225

    申请日：1995-06-05

    申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

    CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

    摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

    摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

    Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
    6.
    发明授权
    Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus 失效
    掩模保持方法，掩模和掩模卡盘，使用掩模和掩模卡盘的曝光装置，以及使用曝光装置的装置制造方法

    公开(公告)号：US5544213A

    公开(公告)日：1996-08-06

    申请号：US343961

    申请日：1994-11-17

    申请人： Yuji Chiba ,  Shinichi Hara

    发明人： Yuji Chiba ,  Shinichi Hara

    IPC分类号： G03F1/66 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F1/22 ,  G03F7/707 ,  G21K1/06

    摘要： V-shaped linear groove portions are formed at regular intervals and at three positions (with 120.degree. pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.

    摘要翻译： V形线状槽部以规定的间隔，在与环状支撑框架同心的三个位置（120度的间距）上形成为沿径向延伸的X射线掩模。 另一方面，在掩模卡盘上的三个位置配置作为突出部的各自具有球形前端的安装件。 通过接合相应的V形直线槽部分和突出部分，将掩模在三个位置保持在掩模卡盘上。

    Exposure apparatus and device manufacturing method using the same
    7.
    发明授权
    Exposure apparatus and device manufacturing method using the same 失效
    曝光装置及其制造方法

    公开(公告)号：US5930324A

    公开(公告)日：1999-07-27

    申请号：US831867

    申请日：1997-04-02

    申请人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

    发明人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30

    CPC分类号： G03F7/702 ,  G03F7/70691 ,  G03F7/70841 ,  G03F9/7015

    摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.

    摘要翻译： 一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件， 由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态 测量部分相对于辐射光的光轴。

    Elevator supervisory system for managing operating condition data
    10.
    发明授权
    Elevator supervisory system for managing operating condition data 失效
    电梯监控系统，用于管理运行状态数据

    公开(公告)号：US07575103B2

    公开(公告)日：2009-08-18

    申请号：US10574606

    申请日：2004-08-11

    申请人： Yuji Chiba

    发明人： Yuji Chiba

    IPC分类号： B66B1/34

    CPC分类号： B66B5/0012

    摘要： An elevator supervisory system capable of managing abnormality data, operating condition data and car interior video data in association with one another, so that this data can be displayed in association with one another upon the occurrence of an abnormality.

    摘要翻译： 一种能够彼此相关联地管理异常数据，操作条件数据和汽车内部视频数据的电梯监控系统，使得可以在发生异常时相关联地显示该数据。