发明授权
US5544213A Mask holding method, mask and mask chuck, exposure apparatus using the
mask and the mask chuck, and device production method using the
exposure apparatus
失效
掩模保持方法，掩模和掩模卡盘，使用掩模和掩模卡盘的曝光装置，以及使用曝光装置的装置制造方法
- 专利标题： Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
- 专利标题（中）： 掩模保持方法，掩模和掩模卡盘，使用掩模和掩模卡盘的曝光装置，以及使用曝光装置的装置制造方法
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申请号： US343961申请日： 1994-11-17
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公开(公告)号： US5544213A公开(公告)日： 1996-08-06
- 发明人: Yuji Chiba , Shinichi Hara
- 申请人： Yuji Chiba , Shinichi Hara
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-299912 19931130
- 主分类号： G03F1/66
- IPC分类号： G03F1/66 ; G03F7/20 ; G21K1/06 ; H01L21/027 ; G21K5/00
摘要：
V-shaped linear groove portions are formed at regular intervals and at three positions (with 120.degree. pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.
公开/授权文献
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