发明授权
- 专利标题： Apparatus for microwave processing in a magnetic field
- 专利标题（中）： 磁场微波处理装置
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申请号： US194571申请日： 1994-02-10
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公开(公告)号： US5609774A公开(公告)日： 1997-03-11
- 发明人: Shunpei Yamazaki , Masaya Kadono , Kenji Itoh , Toru Takayama , Yasuyuki Arai , Noriya Ishida
- 申请人： Shunpei Yamazaki , Masaya Kadono , Kenji Itoh , Toru Takayama , Yasuyuki Arai , Noriya Ishida
- 申请人地址： JPX Kanagawa-ken
- 专利权人： Semiconductor Energy Laboratory Co., Inc.
- 当前专利权人： Semiconductor Energy Laboratory Co., Inc.
- 当前专利权人地址： JPX Kanagawa-ken
- 优先权： JPX1-152909 19890615; JPX1-152910 19890615
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; H01L21/302
摘要：
A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.
公开/授权文献
- US4899094A Method of calibration for an automatic machine tool 公开/授权日：1990-02-06
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