发明授权
US5636160A Nonvolatile semiconductor memory having a stress relaxing voltage
applied to erase gate during data write
失效
在数据写入期间具有施加到擦除栅极的应力松弛电压的非易失性半导体存储器
- 专利标题: Nonvolatile semiconductor memory having a stress relaxing voltage applied to erase gate during data write
- 专利标题(中): 在数据写入期间具有施加到擦除栅极的应力松弛电压的非易失性半导体存储器
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申请号: US570575申请日: 1995-12-11
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公开(公告)号: US5636160A公开(公告)日: 1997-06-03
- 发明人: Sachiko Omino , Tadashi Miyakawa , Masamichi Asano
- 申请人: Sachiko Omino , Tadashi Miyakawa , Masamichi Asano
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX3-201255 19910716
- 主分类号: G11C17/00
- IPC分类号: G11C17/00 ; G11C16/02 ; G11C16/04 ; G11C16/06 ; G11C16/16 ; H01L21/8247 ; H01L27/115 ; H01L29/788 ; H01L29/792
摘要:
A non-volatile semiconductor memory having: a memory cell array having non-volatile memory cells disposed in a matrix form, each memory cell having a floating gate, a control gate, an erase gate, a source and a drain, and data being written through injection of electrons into the floating gate and erased through removal of electrons from the floating gate; and a peripheral circuit driven by a high voltage power source and a low voltage power source, predetermined voltages being applied to the control gate, erase gate and drain respectively of each memory cell to enter one of a data write mode, data erase mode and data read mode, in the data write mode, high voltages being applied to the control gate and drain of the memory cell to be data-written, a stress relaxing voltage being applied to each erase gate of memory cells not to be data-written, and the stress relaxing voltage being an intermediate voltage between the voltages of the high and low power sources.
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