发明授权
US5636256A Apparatus used for total reflection fluorescent X-ray analysis on a
liquid drop-like sample containing very small amounts of impurities
失效
用于在含有非常少量杂质的液滴状样品上进行全反射荧光X射线分析的装置
- 专利标题： Apparatus used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impurities
- 专利标题（中）： 用于在含有非常少量杂质的液滴状样品上进行全反射荧光X射线分析的装置
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申请号： US706363申请日： 1996-08-30
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公开(公告)号： US5636256A公开(公告)日： 1997-06-03
- 发明人: Tuyoshi Matumura , Kunihiro Miyazaki , Hisashi Muraoka
- 申请人： Tuyoshi Matumura , Kunihiro Miyazaki , Hisashi Muraoka
- 申请人地址： JPX Kawasaka JPX Yokohama
- 专利权人： Kabushiki Kaisha Toshiba,Purex Co., Ltd.
- 当前专利权人： Kabushiki Kaisha Toshiba,Purex Co., Ltd.
- 当前专利权人地址： JPX Kawasaka JPX Yokohama
- 优先权： JPX6-090086 19940427
- 主分类号： G01N23/223
- IPC分类号： G01N23/223 ; G01R31/26 ; H01L21/66
摘要：
An apparatus is disclosed which is used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impurities. The apparatus comprises a heat-resistant thin sheet containing an element or elements, as a principal component, not detected on total reflection fluorescent X-ray analysis and an x-ray source directing an X-ray as an incident X-ray at a liquid drop-like sample put on the sheet and containing very small amounts of impurities whereby the liquid drop-like sample is evaporated to a dried solid for the total reflection fluorescent X-ray analysis to be performed there.
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