发明授权
- 专利标题: Method of analysis of distribution of concentration of substrate
- 专利标题(中): 底物浓度分布分析方法
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申请号: US575592申请日: 1995-12-20
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公开(公告)号: US5637870A公开(公告)日: 1997-06-10
- 发明人: Takeshige Tanigaki
- 申请人: Takeshige Tanigaki
- 申请人地址: JPX Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-319631 19941222
- 主分类号: G01N23/225
- IPC分类号: G01N23/225 ; G01Q30/20 ; H01J49/14 ; H01J37/28 ; B01D59/44 ; H01J49/00
摘要:
A method of analysis of the distribution of concentration of a substrate including: a step of preparing a plurality of types of sample substrates whose distribution of concentration is to be analyzed; a step of forming on the surfaces of those substrates dummy films of a material different from the substrates or etching the surfaces of the plurality of sample substrates to different depths; in the case of the dummy films; a step of introducing into the sample substrates specific impurities from the direction of the dummy films under substantially identical conditions and then a step of removing the dummy films; a step of performing mass analysis from the sides of the sample substrates; and a step of sequentially calculating the difference in the results of the mass analysis among the sample substrates.
公开/授权文献
- US4557824A Demetallization of hydrocarbon containing feed streams 公开/授权日:1985-12-10
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