发明授权
- 专利标题： Process for formation of an ultra fine particle film
- 专利标题（中）： 用于形成超细颗粒膜的方法
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申请号： US413447申请日： 1995-03-30
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公开(公告)号： US5665422A公开(公告)日： 1997-09-09
- 发明人: Yoshishige Endo , Masahiko Ono , Hiromitsu Kawamura , Katsumi Kobara
- 申请人： Yoshishige Endo , Masahiko Ono , Hiromitsu Kawamura , Katsumi Kobara
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX3-054371 19910319; JPX4-124502 19920518; JPX6-062274 19940331
- 主分类号： C03C17/00
- IPC分类号： C03C17/00 ; G02B1/11 ; H01J9/20 ; H01J29/86 ; H01J29/89 ; B05D5/12
摘要：
The present invention relates to an ultrafine particle film which is effective for the prevention of electrostatic charge and reflection of visible light and can be applied to a large area, and a process for producing an image display plate to which the ultrafine particle film is applied.This process comprises attaching an object to be coated to a coating solution bath, filling the coating solution bath with a coating solution containing ultrafine particles with a high refractive index, and then exposing the object to be coated, to form an electrically conductive film, the above procedure being repeated by the use of a coating solution containing ultrafine particles with a low refractive index to form a visible light anti-reflection film.
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