发明授权
US5672459A Radiation sensitive resin composition containing quinone diazide ester
having two hindered phenol groups
失效
含有具有两个受阻酚基团的醌二叠氮酯的辐射敏感性树脂组合物
- 专利标题： Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
- 专利标题（中）： 含有具有两个受阻酚基团的醌二叠氮酯的辐射敏感性树脂组合物
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申请号： US621008申请日： 1996-03-22
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公开(公告)号： US5672459A公开(公告)日： 1997-09-30
- 发明人: Katsumi Inomata , Masahiro Akiyama , Toshiyuki Ota , Akira Tsuji
- 申请人： Katsumi Inomata , Masahiro Akiyama , Toshiyuki Ota , Akira Tsuji
- 申请人地址： JPX Tokyo
- 专利权人： Japan Synthetic Rubber Co., Ltd.
- 当前专利权人： Japan Synthetic Rubber Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX7-075785 19950331
- 主分类号： G03F7/022
- IPC分类号： G03F7/022 ; G03F7/023
摘要：
The present invention provides a radiation sensitive resin composition which contains an alkali soluble resin and a 1,2-quinonediazide compound represented by the following formula, for example. ##STR1## The radiation sensitive resin composition of the present invention has an excellent developability, provides an excellent pattern shape, is superior in sensitivity and resolution, and has greatly improved focus latitude and heat resistance in particular. Therefore, the radiation sensitive resin composition of the present invention can be suitably used as a resist for the production of LSIs.
公开/授权文献
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