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21 条记录 (耗时 0.019 秒)

    Shield machine
    1.
    发明授权
    Shield machine 有权
    盾牌机

    公开(公告)号：US08328293B2

    公开(公告)日：2012-12-11

    申请号：US12524550

    申请日：2007-01-26

    申请人： Yasunori Kondo ,  Hiroyoshi Iwata ,  Yasuyuki Sakai ,  Makoto Oda ,  Tooru Niihara ,  Isao Makiuchi ,  Kunihiro Nagamori ,  Katsumi Inomata ,  Hidekazu Anai

    发明人： Yasunori Kondo ,  Hiroyoshi Iwata ,  Yasuyuki Sakai ,  Makoto Oda ,  Tooru Niihara ,  Isao Makiuchi ,  Kunihiro Nagamori ,  Katsumi Inomata ,  Hidekazu Anai

    IPC分类号： E21D9/87

    CPC分类号： E21D9/117 ,  E21D9/0879

    摘要： A shield machine including an excavator capable of excavating tunnels of various cross-sectional shapes, the excavator including: a rotary drum supported at a front end side portion of a shield machine main body to be rotatable around a first center axis; a cutter supporting frame supported by the rotary drum to be rotatable around a second center axis; a rotary cutter head supported by the cutter supporting frame to be rotatable around a third center axis and including a plurality of cutter bits on a surface thereof; a rotary auxiliary cutter head supported by the rotary drum to be rotatable around a fourth center axis; and first, third, and fourth rotating mechanisms, and a swinging drive mechanism configured to respectively cause the rotary drum, the rotary cutter head, the rotary auxiliary cutter head, and the cutter supporting frame to independently rotate.

    摘要翻译： 1.一种盾构机，其特征在于，包括能够挖掘各种截面形状的挖掘机的挖掘机，所述挖掘机包括：旋转滚筒，其支撑在所述盾构机主体的前端侧部分，能够围绕第一中心轴线旋转; 由所述旋转滚筒支撑以能够围绕第二中心轴线旋转的切割器支撑框架; 旋转刀头，其由所述刀具支撑框架支撑，以围绕第三中心轴线旋转并且在其表面上包括多个切割刀头; 旋转辅助切割头，其由所述旋转滚筒支撑以围绕第四中心轴线旋转; 以及分别使旋转滚筒，旋转切割头，旋转辅助切割头和切割器支撑框架分别旋转的摆动驱动机构和第一，第三和第四旋转机构。

    Radiation-sensitive resin composition
    2.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US6048659A

    公开(公告)日：2000-04-11

    申请号：US165096

    申请日：1998-10-02

    申请人： Masaaki Inoue ,  Katsumi Inomata ,  Hiromichi Hara ,  Yoshiji Yumoto

    发明人： Masaaki Inoue ,  Katsumi Inomata ,  Hiromichi Hara ,  Yoshiji Yumoto

    IPC分类号： G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03F7/30

    CPC分类号： G03F7/0048 ,  G03F7/022

    摘要： A radiation-sensitive resin composition including (1) an alkali-soluble resin, (2) a quinonediazide compound and (3) a mixed solvent including a monoketone having 7 to 14 carbon atoms and an alkoxypropionic acid alkyl ester is provided. The composition can be coated in a uniform thickness in a small coating weight. The composition has a high sensitivity and a high resolution, and also enables formation of resist patterns having a superior pattern shape with less pattern defects. Thus, it is suitable as a positive resist.

    摘要翻译： 提供了包含（1）碱溶性树脂，（2）醌二叠氮化合物和（3）含有7-14个碳原子的单酮和烷氧基丙酸烷基酯的混合溶剂的辐射敏感性树脂组合物。 组合物可以以小的涂层重量以均匀的厚度涂覆。 该组合物具有高灵敏度和高分辨率，并且还能够形成具有较少图案缺陷的优异图案形状的抗蚀剂图案。 因此，它适合作为正性抗蚀剂。

    Radiation-sensitive resin composition
    3.
    发明授权
    Radiation-sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US5958645A

    公开(公告)日：1999-09-28

    申请号：US917727

    申请日：1997-08-27

    申请人： Kouichi Hirose ,  Masahiro Akiyama ,  Katsumi Inomata ,  Yoshiji Yumoto

    发明人： Kouichi Hirose ,  Masahiro Akiyama ,  Katsumi Inomata ,  Yoshiji Yumoto

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0226

    摘要： A radiation-sensitive resin composition comprising:(i) an alkali-soluble resin;(ii) a phenol compound represented by the following formula (1): ##STR1## wherein R.sub.1 to R.sub.4 each represent halogen, alkyl, alkoxyl, aryl, nitro, cyano, hydroxyalkyl, hydroxyalkoxyl or hydroxyl; a, b, c and d each represent an integer of 0 to 4 and satisfying 0.ltoreq.a+b.ltoreq.4 and 0.ltoreq.c+d.ltoreq.4, provided that when a+b is 1 and c+d is 1 at least one of R.sub.1 (or R.sub.2) and R.sub.3 (or R.sub.4) is alkyl, hydroxyalkyl or hydroxyalkoxyl; R.sub.5 to R.sub.10 each represent hydrogen, alkyl or aryl; and X.sub.1 and X.sub.2 each represent oxygen or sulfur atom; and(iii) a 1,2-quinonediazide compound. This composition has good resolution, sensitivity and developability, as well as has as a positive resist good focal latitude and heat resistance. The patterns formed have good shapes, and the composition may cause no fine particles during storage.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含：（i）碱溶性树脂; （ii）由下式（1）表示的酚化合物：其中R1至R4各自表示卤素，烷基，烷氧基，芳基，硝基，氰基，羟烷基，羟基烷氧基或羟基; a，b，c和d分别表示0〜4的整数，满足0

    Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
    4.
    发明授权
    Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups 失效
    含有具有两个受阻酚基团的醌二叠氮酯的辐射敏感性树脂组合物

    公开(公告)号：US5672459A

    公开(公告)日：1997-09-30

    申请号：US621008

    申请日：1996-03-22

    申请人： Katsumi Inomata ,  Masahiro Akiyama ,  Toshiyuki Ota ,  Akira Tsuji

    发明人： Katsumi Inomata ,  Masahiro Akiyama ,  Toshiyuki Ota ,  Akira Tsuji

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： The present invention provides a radiation sensitive resin composition which contains an alkali soluble resin and a 1,2-quinonediazide compound represented by the following formula, for example. ##STR1## The radiation sensitive resin composition of the present invention has an excellent developability, provides an excellent pattern shape, is superior in sensitivity and resolution, and has greatly improved focus latitude and heat resistance in particular. Therefore, the radiation sensitive resin composition of the present invention can be suitably used as a resist for the production of LSIs.

    摘要翻译： 本发明提供了含有碱溶性树脂和下式所示的1,2-醌二叠氮化合物的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物具有优异的显影性，提供优异的图案形状，灵敏度和分辨率优异，特别是大大提高了聚焦纬度和耐热性。 因此，本发明的感光性树脂组合物可以适合用作制造LSI的抗蚀剂。

    Shield Machine
    5.
    发明申请
    Shield Machine 有权
    盾牌机

    公开(公告)号：US20100164274A1

    公开(公告)日：2010-07-01

    申请号：US12524550

    申请日：2007-01-26

    申请人： Yasunori Kondo ,  Hiroyoshi Iwata ,  Yasuyuki Sakai ,  Makoto Oda ,  Tooru Niihara ,  Isao Makiuchi ,  Kunihiro Nagamori ,  Katsumi Inomata ,  Hidekazu Anai

    发明人： Yasunori Kondo ,  Hiroyoshi Iwata ,  Yasuyuki Sakai ,  Makoto Oda ,  Tooru Niihara ,  Isao Makiuchi ,  Kunihiro Nagamori ,  Katsumi Inomata ,  Hidekazu Anai

    IPC分类号： E21D9/08 ,  E21C27/20 ,  E21D23/03

    CPC分类号： E21D9/117 ,  E21D9/0879

    摘要： The present invention provides a shield machine (1) including an excavator (5) capable of excavating tunnels of various cross-sectional shapes, the excavator (5) including: a rotary drum (40) supported at a front end side portion of a shield machine main body (2) to be rotatable around a first center axis (A1); a cutter supporting frame (50) supported by the rotary drum to be rotatable around a second center axis (A2); a rotary cutter head (60) supported by the cutter supporting frame (50) to be rotatable around a third center axis (A3) and including a plurality of cutter bits (61) on a surface thereof; a rotary auxiliary cutter head (70) supported by the rotary drum (40) to be rotatable around a fourth center axis (A4); and first, third, and fourth rotating mechanisms (45, 65, and 75), and a swinging drive mechanism (55) configured to respectively cause the rotary drum (40), the rotary cutter head (60), the rotary auxiliary cutter head (70), and the cutter supporting frame (50) to independently rotate.

    摘要翻译： 本发明提供一种包括能够挖掘各种截面形状的隧道的挖掘机（5）的盾构机（1），所述挖掘机（5）包括：旋转滚筒（40），其被支撑在屏蔽件的前端侧部分 机器主体（2）能够围绕第一中心轴线（A1）旋转; 由所述旋转滚筒支撑以能够围绕第二中心轴线（A2）旋转的切割器支撑框架（50）; 旋转刀头（60），其由所述切割器支撑框架（50）支撑以能够围绕第三中心轴线（A3）旋转，并且在其表面上包括多个切割刀头（61）; 旋转辅助刀头（70），其由所述旋转鼓（40）支撑以围绕第四中心轴线（A4）旋转; 和第一，第三和第四旋转机构（45,65和75）以及摆动驱动机构（55），其构造成分别使旋转滚筒（40），旋转切割头（60），旋转辅助切割头 （70）和切割器支撑框架（50）独立旋转。

    TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME
    6.
    发明申请
    TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME 审中-公开
    两层膜及其形成图案的方法

    公开(公告)号：US20070248905A1

    公开(公告)日：2007-10-25

    申请号：US11763011

    申请日：2007-06-14

    申请人： Masaru OHTA ,  Atsushi ITO ,  Isamu Mochizuki ,  Katsumi INOMATA ,  Shin-ichiro IWANAGA

    发明人： Masaru OHTA ,  Atsushi ITO ,  Isamu Mochizuki ,  Katsumi INOMATA ,  Shin-ichiro IWANAGA

    IPC分类号： G03C5/18

    CPC分类号： G03F7/0236 ,  G03F7/0233 ,  G03F7/095 ,  G03F7/40

    摘要： The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate. The method comprises the steps of: sequentially applying positive radiation-sensitive resin compositions 1 and 2 to form a two-layer laminate; subjecting the two-layer resist to single exposure and development to produce fine patterns having an undercut cross section; depositing and/or sputtering an organic or inorganic thin layer with use of the resist pattern as a mask; and lifting off the resist pattern to leave a pattern of the thin layer in desired shape.

    摘要翻译： 本发明涉及用于图案化沉积和/或溅射的层的剥离工艺。 本发明提供一种使用该抗蚀剂的双层抗蚀剂和图案化方法。 图案化方法可以容易地在衬底上产生无毛刺层。 该方法包括以下步骤：依次施加正性辐射敏感性树脂组合物1和2以形成双层层压体; 对两层抗蚀剂进行单次曝光和显影以产生具有底切横截面的精细图案; 使用抗蚀剂图案作为掩模沉积和/或溅射有机或无机薄层; 并且提起抗蚀剂图案以将薄层的图案留下所需的形状。

    Photosensitive insulating resin composition and cured product thereof
    7.
    发明申请
    Photosensitive insulating resin composition and cured product thereof 审中-公开
    感光性绝缘树脂组合物及其固化物

    公开(公告)号：US20070027231A1

    公开(公告)日：2007-02-01

    申请号：US10571108

    申请日：2004-08-31

    申请人： Hirohumi Goto ,  Katsumi Inomata ,  Shin-ichiro Iwanaga

    发明人： Hirohumi Goto ,  Katsumi Inomata ,  Shin-ichiro Iwanaga

    IPC分类号： C03C17/00

    CPC分类号： G03F7/038 ,  H01L21/02126 ,  H01L21/0271 ,  H01L21/312

    摘要： The present invention provides a photosensitive insulating resin composition which can be cured at low temperatures without inhibiting functions of an organic semiconductor device or the like, by the use of which a cured product excellent in various properties such as resolution, electrical insulation, thermal shock resistance and chemical resistance can be obtained and which is suitably used for a surface protective film or a layer insulating film of a semiconductor device. The photosensitive insulating resin composition of the present invention comprises a copolymer (A), which is obtained by copolymerizing monomer components containing a vinyl monomer having an epoxy group and a vinyl monomer having an oxetanyl group, and a photosensitive acid generator (B). The copolymer (A) is preferably obtained by copolymerizing monomer components containing a vinyl monomer having an epoxy group, a vinyl monomer having an oxetanyl group and another vinyl monomer.

    摘要翻译： 本发明提供一种可以在低温下固化而不抑制有机半导体器件等的功能的光敏绝缘树脂组合物，通过使用其分辨率，电绝缘性，耐热冲击性等各种性能优异的固化产物 并且可以获得耐化学性，并且其适用于半导体器件的表面保护膜或层间绝缘膜。 本发明的感光性绝缘性树脂组合物含有通过使含有具有环氧基的乙烯基单体和具有氧杂环丁烷基的乙烯基单体的单体成分和感光性酸发生剂（B）共聚得到的共聚物（A）。 共聚物（A）优选通过使含有具有环氧基的乙烯基单体，具有氧杂环丁烷基的乙烯基单体和其它乙烯基单体的单体组分共聚而获得。