发明授权
US5684565A Pattern detecting method, pattern detecting apparatus, projection
exposing apparatus using the same and exposure system
失效
图案检测方法，图案检测装置，使用其的投影曝光装置和曝光系统
- 专利标题： Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system
- 专利标题（中）： 图案检测方法，图案检测装置，使用其的投影曝光装置和曝光系统
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申请号： US304586申请日： 1994-09-12
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公开(公告)号： US5684565A公开(公告)日： 1997-11-04
- 发明人: Yoshitada Oshida , Hisafumi Iwata , Yasuhiro Yoshitake , Minoru Yoshida , Yukihiro Shibata
- 申请人： Yoshitada Oshida , Hisafumi Iwata , Yasuhiro Yoshitake , Minoru Yoshida , Yukihiro Shibata
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX5-225432 19930910
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00 ; H01L21/027 ; G03B27/42 ; G03B27/72
摘要：
A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.
公开/授权文献
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