发明授权
US5686211A Method and apparatus for removing a thin film layer 失效
去除薄膜层的方法和装置

Method and apparatus for removing a thin film layer
摘要:
A method and apparatus whereby a thin film layer covering a plurality of marks of a given pattern formed on a surface of a substrate is selectively removed from each of a plurality of localized areas each including one of the marks by irradiation of an energy beam. The mark is detected by a mark detecting system in a noncontact manner during the irradiation of the energy beam or during a time that the irradiation is stopped, thereby producing an electric signal including information corresponding to a change of an optical or physical property of the localized area. In accordance with the electric signal produced by the mark detecting system, it is evaluated whether the information indicative of the optical or physical property of the mark has attained a predetermined condition for a predetermined information processing application of the information. In accordance with a result of the evaluation, it is selected whether the irradiation of the energy beam onto the localized area is to be effected continuously.
公开/授权文献
信息查询
0/0