发明授权
- 专利标题： UV exposure with elongated service lifetime
- 专利标题（中）： 紫外线曝光，延长使用寿命
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申请号： US216962申请日： 1994-03-24
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公开(公告)号： US5696623A公开(公告)日： 1997-12-09
- 发明人: Nobuo Fujie , Hitoshi Obara , Keiji Kuroiwa , Masaki Nakamura , Kazuya Watanabe , Takashi Aruga , Nobutaka Horii , Motokazu Suzuki , Tadahiro Hayashi
- 申请人： Nobuo Fujie , Hitoshi Obara , Keiji Kuroiwa , Masaki Nakamura , Kazuya Watanabe , Takashi Aruga , Nobutaka Horii , Motokazu Suzuki , Tadahiro Hayashi
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPXHEI5-194811 19930805; JPXHEI5-194812 19930805; JPXHEI5-337539 19931228
- 主分类号： G02B13/14
- IPC分类号： G02B13/14 ; G03F7/20 ; G03F7/00 ; G02B27/00 ; H01L21/30
摘要：
In an ultraviolet exposure apparatus, substances contained in an atmosphere contacting a lens surface are reduced, the substances generating accumulations on the lens surface. Openings are formed in the wall of a lens barrel to allow the atmosphere to be replaced by a proper gas. The proper atmospheric gas may be a gas not containing oxygen such as a nitrogen gas, or clean air obtained by intentionally generating accumulations by applying ultraviolet light to source air. A ultraviolet light source is preferably cooled by a cooling system different from the cooling system of a lens optical system.