- 专利标题: Precision analog metal-metal capacitor
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申请号: US549450申请日: 1995-10-27
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公开(公告)号: US5708559A公开(公告)日: 1998-01-13
- 发明人: Terry J. Brabazon , Badih El-Kareh , Stuart R. Martin , Matthew J. Rutten , Carter W. Kaanta
- 申请人: Terry J. Brabazon , Badih El-Kareh , Stuart R. Martin , Matthew J. Rutten , Carter W. Kaanta
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: H01L27/04
- IPC分类号: H01L27/04 ; H01L21/02 ; H01L21/768 ; H01L21/822 ; H01G4/20 ; H01G4/06
摘要:
A precision analog metal-metal capacitor is fabricated by forming a first capacitor plate in an insulation layer by forming a trench therein, depositing metal within the trench and planarizing the device. A thin dielectric layer is then deposited and patterned over the first capacitor plate. A second insulator is then deposited over the device and discrete openings etched therein to expose the insulation layer and first metal plate. Metal is deposited within the openings and planarized, thereby forming a contact to the first metal plate and the second metal plate of the capacitor.
公开/授权文献
- US4531909A Handling system for IC device 公开/授权日:1985-07-30
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